Deposition of copper oxide thin films on different substrates by pulsed excimer laser ablation

Abstract

Stoichiometric films of cupric and cuprous oxide are deposited on Si, MgO, and Y-ZrO2 substrates by pulsed excimer laser ablation technique. It is found that the equilibrium phase diagram based considerations dictate the phase formation. The films are characterized by small-angle x-ray diffraction, infrared, and UV-visible spectroscopies and Rutherford backscattering spectroscopy. It is shown that epitaxy of Cu2O films can be realized on single crystal MgO (100) substrates and the corresponding film resistivity is of the order of 40–60 Ω cm.

Epitaxial growth of copper oxide films by reactive cross-beam pulsed-laser deposition

“…Indeed, the FWHM values of 0.81 and 1.251, respectively, measured on these lines characterize the existence of rather well-oriented crystallites in the films. Similar results have been obtained in the past on PLD films grown at 700 1C under 10 À3 mTorr in oxygen pressure from laser ablation of CuO target [6].…”

“…The growth of pure or doped CuO and Cu 2 O films obtained by pulsed-laser deposition (PLD) in controlled atmosphere has already been largely studied [5][6][7] and the results highlight various structural properties (nature of phases, orientation of crystallites, in-plane epitaxial relationships) depending on the growth conditions and the substrate used. In this work, we have studied the growth of CuO and Cu 2 O films by reactive cross-beam PLD (CBPLD) assisted by radio-frequency (RF) discharge in oxygen atmosphere on cubic single crystal (1 0 0) MgO substrates.…”

Oxidation mechanism of thin Cu films: A gateway towards the formation of single oxide phase

“…Various growth techniques have been employed for device quality copper oxides formation such as, sol-gel process, 24 spray pyrolysis, 25 solution growth, 26 chemical vapour deposition (CVD), 27 pulsed laser deposition (PLD) 28 and DC and RF magnetron sputtering, [29][30][31][32] molecular beam epitaxy (MBE), 33 anodic and chemical oxidations, 34,35 and electrochemical deposition. [36][37][38] These growth techniques generally require some special growth conditions, however, still results in a mixed oxide phases.…”

Synthesis of aluminum oxide nanoparticles using laser ablation in liquid

“…The pulsed laser ablation (PLA) is used in synthesis of nanoparticles (NPs) [1], thin film fabrication [2], surface cleaning [3], and microstructure fabrication [4], etc. When a laser beam with sufficient energy is focused onto a solid target surface, absorption of laser energy leads to the breakdown of the material.…”