Deposition of diamond from alcohol precursors in an electron cyclotron resonance plasma system

Gilbert, Donald R.; Carasso, Melanie L.; Demkowicz, Paul A.; Singh, Rajiv K.; Adair, James H.

doi:10.1007/s11664-997-0079-7

Cited by 4 publications

(1 citation statement)

References 12 publications

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“…By simple dipping of the coated substrate into the ND solution, electrostatic interactions ensure a spontaneous grafting of the particles onto the surface. A related method and its application to diamond nanoparticles have been already reported . Actually, ionic interactions are also reported to be involved in the strong adsorption of proteins on NDs , .…”

Section: Introductionmentioning

confidence: 99%

Electrostatic Grafting of Diamond Nanoparticles: A Versatile Route to Nanocrystalline Diamond Thin Films

Girard

Perruchas

Gesset

et al. 2009

ACS Appl. Mater. Interfaces

103

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Nanodiamond (ND) seeding is a well-established route toward the CVD (chemical vapor deposition) synthesis of diamond ultrathin films. This method is based on the deposition onto a substrate of diamond nanoparticles which act as pre-existing sp(3) seeds. Here, we report on a straightforward method to disperse diamond nanoparticles on a substrate by taking advantage of the electrostatic interactions between the nanodiamonds and the substrate surface coated with a cationic polymer. This layer-by-layer deposition technique leads to reproducible and homogeneous large-scale nanoparticle deposits independent of the substrate's nature and shape. No specific functionalization of the nanoparticles is required, and low concentrated solutions can be used. The density of NDs on the substrate can be controlled, as shown by in situ ATR-FTIR (attenuated total reflection Fourier transform infrared) analysis and QCM (quartz crystal microbalance) measurements. Highly dense and compact ND deposits can be obtained, allowing CVD growth of nanocrystalline diamond ultrathin films (70 nm) on various substrates. The synthesis of 3D structured and patterned diamond thin films has also been demonstrated with this method.

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Section: Introductionmentioning

confidence: 99%

Electrostatic Grafting of Diamond Nanoparticles: A Versatile Route to Nanocrystalline Diamond Thin Films

Girard

Perruchas

Gesset

et al. 2009

ACS Appl. Mater. Interfaces

103

View full text Add to dashboard Cite

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Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition

Gupta

Katiyar

Gilbert

et al. 2000

Journal of Applied Physics

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A detailed investigation of the correlation among intrinsic stress (σint), nonuniform stress (σnu), and phonon lifetime (1/Γ) was performed in order to obtain a coherent and comprehensive picture of the microstructure of diamond thin films grown by the electron cyclotron resonance-assisted chemical vapor deposition (ECR-CVD) technique. It was found that the diamond growth taking place by the ECR-CVD is different to that taking place by the microwave CVD and hot-filament CVD. Point and line defects, rather than sp2 C bonds, were found to be the dominant source of both nonuniform stress and reduced phonon lifetime. The surface relaxation mechanism in these films yields sp2 C at the expense of strained sp3 C, resulting in a trade off between diamond yield and crystalline quality. The diamond precursor that spontaneously forms on the unseeded substrates yielded higher quality diamond than planted diamond seeds. The grain boundary relaxation model proposed by Hoffman accounts well for the observed behavior of the intrinsic stress, thus indicating that microstructural restructuration takes place at the grain boundaries when sufficient time and thermal energy are provided.

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Chemical Vapor Deposition of Diamond from Alcohol Precursors at 1.0 Torr

1998

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Typically, diamond chemical vapor deposition (CVD) is conducted at pressures of 10 to 100 Torr and temperatures of 700 - 1000 °C. Both thermally activated (hot-filament) and plasma enhanced (DC, microwave) systems are used to deposit diamond from mixtures of hydrogen and some carbon-containing monomer, most typically methane. These systems may produce films of high phase purity which typically exhibit tensile intrinsic (non-thermal) growth stresses. We have used an electron cyclotron resonance (ECR) enhanced plasma system to deposit diamond films at a pressure of 1 Torr over a temperature range of 550 - 700 °C using methyl alcohol as the carbon source. Optical emission spectroscopy (OES) was used to analyze the plasma discharge for the determination of active species present during diamond growth. Correlations of emission variations with film characteristics were made to evaluate their importance in the diamond formation process. Particular emphasis was placed on the nature of the intrinsic growth stresses developed in this process, which appeared to be consistently compressive in nature based on Raman analysis.

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Deposition of diamond from alcohol precursors in an electron cyclotron resonance plasma system

Cited by 4 publications

References 12 publications

Electrostatic Grafting of Diamond Nanoparticles: A Versatile Route to Nanocrystalline Diamond Thin Films

Electrostatic Grafting of Diamond Nanoparticles: A Versatile Route to Nanocrystalline Diamond Thin Films

Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition

Chemical Vapor Deposition of Diamond from Alcohol Precursors at 1.0 Torr

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