Deposition of optical thin films by pulsed laser assisted evaporation

Sankur, H.; Gunning, W. J.

doi:10.1364/ao.28.002806

Cited by 72 publications

(18 citation statements)

References 10 publications

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“…In addition to its potential use as a gate dielectric, HfO 2 is also used as an optical coating because of its high refractive index and high transmission coefficient. 5,6 Additionally, HfO 2 exhibits a relatively high laser damage threshold due to its high melting point, thermal and chemical stability and wide transparent range from the infrared to ultraviolet. 7,8 Furthermore, HfO 2 serves as an excellent protective coating due to its thermal stability and hardness.…”

Section: Introductionmentioning

confidence: 99%

First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces

2006

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We have carried out a systematic theoretical study of the surfaces of monoclinic hafnia ͑HfO 2 ͒ using plane waves and density functional theory based on the generalized gradient approximation. The fully relaxed structures of the bulk phases of HfO 2 are found to be in excellent agreement with experimental data, the monoclinic phase being the most stable. Simulations of the monoclinic phase surfaces indicate a large relaxation which reduces the total surface energy of all nine faces considered by between 23% and 36%, with a strong correlation between the unrelaxed and relaxed surface energies. Our calculations predict that the ͑111͒ and ͑111͒ faces of the monoclinic phase have the lowest surface energies and are hence the most stable faces. An analysis of the total and partial electronic density of states of bulk monoclinic HfO 2 reveals that the outer valence band significantly mixes the O 2p and Hf 5d atomic states indicating some covalency of the Hf-O bonds. The total density and partial density of states of the monoclinic surfaces exhibit a surface state corresponding to the surface O 2s states in the inner valence band region.

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Section: Introductionmentioning

confidence: 99%

First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces

2006

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“…1,[3][4][5] In addition to its potential use in the microelectronics industry, HfO 2 is also employed in optical coatings because of its high refractive index and high transmission coefficient. 6 Accurate thickness control and thickness uniformity of the deposited HfO 2 film are also required for these applications.…”

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confidence: 99%

Atomic layer deposition of hafnium oxide: A detailed reaction mechanism from first principles

Widjaja

Musgrave

2002

The Journal of Chemical Physics

102

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Atomic layer deposition (ALD) of hafnium oxide (HfO2) using HfCl4 and H2O as precursors is studied using density functional theory. The mechanism consists of two deposition half-reactions: (1) HfCl4 with Hf-OH sites, and (2) H2O with Hf-Cl sites. Both half-reactions exhibit stable intermediates with energies lower than those of the final products. We show that increasing the temperature reduces the stability of the complex. However, increasing temperature also increases the dissociation free-energy barrier, which in turn results in increased desorption of adsorbed precursors. Both half-reactions are qualitatively similar to the corresponding reactions of ZrO2 ALD using ZrCl4 and H2O.

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“…Several approaches and techniques have been developed to address these challenges relating to film quality in both MS and PLD 12–14 . Unbalanced magnetron sputtering 15 , the high power impulse MS (HIPIMS) process 16 , and plasma assisted PLD 17 are recent developments that can improve certain characteristics of the deposited films.…”

Section: Introductionmentioning

confidence: 99%

Combined magnetron sputtering and pulsed laser deposition of TiO 2 and BFCO thin films

Benetti

Nouar

Nechache

et al. 2017

Sci Rep

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We report the successful demonstration of a hybrid system that combines pulsed laser deposition (PLD) and magnetron sputtering (MS) to deposit high quality thin films. The PLD and MS simultaneously use the same target, leading to an enhanced deposition rate. The performance of this technique is demonstrated through the deposition of titanium dioxide and bismuth-based perovskite oxide Bi2FeCrO6 (BFCO) thin films on Si(100) and LaAlO3 (LAO) (100). These specific oxides were chosen due to their functionalities, such as multiferroic and photovoltaic properties (BFCO) and photocatalysis (TiO2). We compare films deposited by conventional PLD, MS and PLD combined with MS, and show that under all conditions the latter technique offers an increased deposition rate (+50%) and produces films denser (+20%) than those produced by MS or PLD alone, and without the large clusters found in the PLD-deposited films. Under optimized conditions, the hybrid technique produces films that are two times smoother than either technique alone.

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Deposition of optical thin films by pulsed laser assisted evaporation

Cited by 72 publications

References 10 publications

First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces

First-principles calculations of structural and electronic properties of monoclinic hafnia surfaces

Atomic layer deposition of hafnium oxide: A detailed reaction mechanism from first principles

Combined magnetron sputtering and pulsed laser deposition of TiO 2 and BFCO thin films

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