“…In general, the band shape and barrier height of the heterojunction can be effectively modulated by applying an external gate voltage on the back-gate silicon electrode. − As shown in Figure a,b, the N-IGZO has a large number of electrons, the electron drifts from IGZO to WS 2 to overcome the WS 2 /IGZO barrier under a constant positive V ds . With a negative V gs , the electron concentrations of IGZO near the SiO 2 dielectric substrate decrease, which induces the E c of IGZO decrease according to the equation of electron concentrations, n 0 = N c × exp(−( E c – E F )/ k 0 T ), where N c is the effective density of states of the conduction band, k 0 is the Boltzman constant, T is the temperature, and results in the upward band bending between the SiO 2 and IGZO films. On the contrary, after applying a positive V gs , the electron concentration in IGZO increase near the SiO 2 substrate and shift the Fermi level downward, forming a downward band bending (see Figure c,d).…”