2015
DOI: 10.3390/s150922692
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Design and Application of a High Sensitivity Piezoresistive Pressure Sensor for Low Pressure Conditions

Abstract: In this paper, a pressure sensor for low pressure detection (0.5 kPa–40 kPa) is proposed. In one structure (No. 1), the silicon membrane is partly etched to form a crossed beam on its top for stress concentration. An aluminum layer is also deposited as part of the beam. Four piezoresistors are fabricated. Two are located at the two ends of the beam. The other two are located at the membrane periphery. Four piezoresistors connect into a Wheatstone bridge. To demonstrate the stress concentrate effect of this str… Show more

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Cited by 39 publications
(13 citation statements)
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“…Each pressure test point of the forward travel ( U inc ) rises from 0 kPa to itself, and each pressure test point of the reverse travel ( U dec ) falls from 100 kPa to itself [ 5 ]. As we all known, the hysteresis and repeatability are related to the creep of the material itself and residual stresses in the package [ 39 ], here we take PS3/PS4 sensor as an example. The experiment results without compensation at 20 °C are listed in Table 3 .…”
Section: Experimental Section and Discussionmentioning
confidence: 99%
“…Each pressure test point of the forward travel ( U inc ) rises from 0 kPa to itself, and each pressure test point of the reverse travel ( U dec ) falls from 100 kPa to itself [ 5 ]. As we all known, the hysteresis and repeatability are related to the creep of the material itself and residual stresses in the package [ 39 ], here we take PS3/PS4 sensor as an example. The experiment results without compensation at 20 °C are listed in Table 3 .…”
Section: Experimental Section and Discussionmentioning
confidence: 99%
“…et al [11], Zou, H. et al [12] and Meng, X. et al [13] improved the sensitivity and linearity by designing the island/beam structure on a flat diaphragm. Pramanik, C. et al [14] and Yu, H. et al [15] optimized the design of the flat pressure sensor by adjusting the doping concentration of piezoresistive material and the thickness of the diaphragm. In addition, for realizing the miniaturization, reducing the thickness of the sensor and protecting the device from fragmentation in the followed processes are the key steps.…”
Section: Of 10mentioning
confidence: 99%
“…The silicon piezoresistive pressure sensor adopts the advanced miniaturization manufacturing process to integrate the silicon pressure diaphragm as the sensing element, and takes advantage of the piezoresistive effect of polysilicon to prepare four polysilicon varistors by deposition on the insulating layer of silicon dioxide deposited on the pressure diaphragm to form the Wheatstone bridge [ 22 , 23 ]. A schematic diagram of the silicon piezoresistive pressure sensor is shown in Figure 1 , and the circuit of the Wheatstone bridge is shown in Figure 2 .…”
Section: Development Of Miniature Silicon Piezoresistive Sensormentioning
confidence: 99%