2016
DOI: 10.1063/1.4940364
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Design and application of ion-implanted polySi passivating contacts for interdigitated back contact c-Si solar cells

Abstract: Ion-implanted passivating contacts based on poly-crystalline silicon (polySi) are enabled by tunneling oxide, optimized, and used to fabricate interdigitated back contact (IBC) solar cells. Both n-type (phosphorous doped) and p-type (boron doped) passivating contacts are fabricated by ion-implantation of intrinsic polySi layers deposited via low-pressure chemical vapor deposition and subsequently annealed. The impact of doping profile on the passivation quality of the polySi doped contacts is studied for both … Show more

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Cited by 52 publications
(39 citation statements)
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“…Some wafers are chemically textured on both sides in an alkaline solution containing H 2 O, TMAH, and Alkatex to obtain random pyramids. Before processing, we remove the native oxide via a short HF dip, and afterwards, we wet‐chemically oxidize the c‐Si surfaces using a nitric acid solution to grow an approximately 1.5‐nm‐thick SiO 2 buffer layer as described in Yang et al The samples are then coated with intrinsic amorphous silicon layer deposited by a Tempress LPCVD reactor at a temperature of 580°C, pressure of 150 mTorr, and SiH 4 flow of 45 sccm. The deposition time is adapted to obtain layers with thickness of 250, 75, 35, and 20 nm.…”
Section: Methodsmentioning
confidence: 99%
“…Some wafers are chemically textured on both sides in an alkaline solution containing H 2 O, TMAH, and Alkatex to obtain random pyramids. Before processing, we remove the native oxide via a short HF dip, and afterwards, we wet‐chemically oxidize the c‐Si surfaces using a nitric acid solution to grow an approximately 1.5‐nm‐thick SiO 2 buffer layer as described in Yang et al The samples are then coated with intrinsic amorphous silicon layer deposited by a Tempress LPCVD reactor at a temperature of 580°C, pressure of 150 mTorr, and SiH 4 flow of 45 sccm. The deposition time is adapted to obtain layers with thickness of 250, 75, 35, and 20 nm.…”
Section: Methodsmentioning
confidence: 99%
“…Interdigitated back contact (IBC) crystalline silicon solar cells are attracting much attention in the solar cells research society due to their potential to achieve a high power conversion efficiency by eliminating the shading losses altogether through putting both contacts on the rear of the cells [1,2]. Many institutes such as Fraunhofer ISE, ECN, and ISC-Konstanz are now working on IBC solar cells and their commercialization [3,4].…”
Section: Introductionmentioning
confidence: 99%
“…The rear hole-and electron-selective contact interfaces are planar and disconnected by a 1-μm-large curved gap that results from the self-aligned process [22]. To passivate the rear side of c-Si absorber bulk, a 1.5-nm-thick tunneling SiO 2 layer is formed by means of nitric acid oxidation of silicon [54]. The front surface field (FSF) is formed by phosphorus implantation.…”
Section: Simulation Methodologymentioning
confidence: 99%