2018
DOI: 10.1107/s2052252517016219
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Determination of atomic vacancies in InAs/GaSb strained-layer superlattices by atomic strain

Abstract: Determining vacancy in complex crystals or nanostructures represents an outstanding crystallographic problem that has a large impact on technology, especially for semiconductors, where vacancies introduce defect levels and modify the electronic structure. However, vacancy is hard to locate and its structure is difficult to probe experimentally. Reported here are atomic vacancies in the InAs/GaSb strained-layer superlattice (SLS) determined by atomic-resolution strain mapping at picometre precision. It is shown… Show more

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Cited by 7 publications
(3 citation statements)
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“…The presence of point defects is usually inferred from indirect measures such as lattice distortions. 9 Although it is conceivable that they could be detected in tomographic reconstructions, it would be challenging to distinguish atoms close in atomic number, 10 and in general, it would not be possible to distinguish substitutional from interstitial impurity atoms.…”
Section: Introductionmentioning
confidence: 99%
“…The presence of point defects is usually inferred from indirect measures such as lattice distortions. 9 Although it is conceivable that they could be detected in tomographic reconstructions, it would be challenging to distinguish atoms close in atomic number, 10 and in general, it would not be possible to distinguish substitutional from interstitial impurity atoms.…”
Section: Introductionmentioning
confidence: 99%
“…The characterization of disorder remains a perennial challenge in the structural science of materials. The work of Kim et al (2018) provides a very significant contribution to this field. They report on atomic resolution strain analysis for vacancy detection in InAs/ GaSb strained super-lattices with high-angle annular-dark-field (HAADF) imaging in a scanning transmission electron microscope (STEM).…”
mentioning
confidence: 99%
“…This talk will first review high resolution and high sensitivity electron beam techniques for strain characterization in nanodevices and device materials. Examples include planar and a finfet transistors and III-V heterostructures [6,7]. We then propose new SEND approaches and algorithms for high resolution and high sensitivity strain mapping, which will be demonstrated using a combination of experimental data and multislice simulations [8].…”
mentioning
confidence: 99%