Development of New Mica Abrasives Suitable for High Performance Mechanochemical Polishing of Si Wafers

Abstract

Mica powder which has never been reported as abrasives was found to be very effective for mechanochemical polishing of Silicon wafers. It has demonstrated to be excellent in terms of polishing rates and surface roughness, when a polisher was used much harder than the conventional hard polishers. The use of this type of new abrasives enables to improve the wafer flatness to meet the demand to reduce the edge exclusion for the next generation silicon wafers. Experimental ProcedureThe polishing experiment was carried out using a small polishing machine shown in Fig. 3, where

XRD Characterization of Sand Deposit in River Niger (South Eastern Nigeria)

“…Mica has been known as a typical insulator and is used as filler for cosmetics, paints, machinable-ceramics, etc. The component of mica is SiO 2 (40-50 wt %) [3]. Very strongly bonded SiO 4 tetrahedral range as a sheet of hexagonal net between the sandwich-type plates called "tablets" are pulling up and between these tablets exist alkaline metals or alkaline earth metals which are weakly bonded with 12 oxygen atoms on the upper and lower plates [3].…”

“…The component of mica is SiO 2 (40-50 wt %) [3]. Very strongly bonded SiO 4 tetrahedral range as a sheet of hexagonal net between the sandwich-type plates called "tablets" are pulling up and between these tablets exist alkaline metals or alkaline earth metals which are weakly bonded with 12 oxygen atoms on the upper and lower plates [3]. Clay product derived from the weathering and hydrothermal reactions of rocks is a versatile industrial mineral that has amazing variety of uses and application as in petroleum cracking, cosmetic base, paper chalk, ceramics porcelain, dinner works, architectural tiles, pharmaceutical industries, etc [4,5].…”

Influences of nanoscale abrasive suspensions on the polishing of fiber-optic connectors

“…However, diamond abrasives unavoidably induce microscratches in the machined ceramic surfaces [8][9][10]. Thus, efforts have been made to develop applications of soft abrasives to improve the surface quality, including silica, iron oxide and magnesium oxide for polishing of sapphire, quartz and silicon single crystal, in which the mechanochemical mechanisms were considered to function [11][12][13][14]. Research has also been done on the chemical-mechanical polishing of glass using cerium oxide [15] and of single crystal silicon carbide using chromium oxide [16] for better surface finish.…”