Development of surface-textured hydrogenated ZnO:Al thin-films for μc-Si solar cells

Tark, Sung Ju; Kang, Min Gu; Park, Sungeun; Jang, Ji Hoon; Lee, Jeong Chul; Kim, Won Mok; Lee, Joon Sung; Kim, Dong Hwan

doi:10.1016/j.cap.2008.12.015

Cited by 42 publications

(17 citation statements)

References 11 publications

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“…Transparent Conductive Oxides (TCO) films play a significant role as an transparent electrode in the optoelectronic and photovoltaic devices, especially in thin films solar cells [1][2][3][4][5][6]. The most widely used TCO, both in research and industry, are Indium Tin Oxide (ITO) films, because they are characterized by a good electrical and optical properties.…”

Section: Introductionmentioning

confidence: 99%

Influence of sputtering deposition parameters on electrical and optical properties of aluminium-doped zinc oxide thin films for photovoltaic applications

Krawczak¹,

Zdyb²,

Gulkowski³

et al. 2017

E3S Web Conf.

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Abstract. Transparent Conductive Oxides (TCOs) characterized by high visible transmittance and low electrical resistivity play an important role in photovoltaic technology. Aluminum doped zinc oxide (AZO) is one of the TCOs that can find its application in thin film solar cells (CIGS or CdTe PV technology) as well as in other microelectronic applications. In this paper some optical and electrical properties of ZnO:Al thin films deposited by RF magnetron sputtering method have been investigated. AZO layers have been deposited on the soda lime glass substrates with use of variable technological parameters such as pressure in the deposition chamber, power applied and temperature during the process. The composition of AZO films has been investigated by EDS method. Thickness and refraction index of the deposited layers in dependence on certain technological parameters of sputtering process have been determined by spectroscopic ellipsometry. The measurements of transmittance and sheet resistance were also performed.

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Section: Introductionmentioning

confidence: 99%

Influence of sputtering deposition parameters on electrical and optical properties of aluminium-doped zinc oxide thin films for photovoltaic applications

Krawczak¹,

Zdyb²,

Gulkowski³

et al. 2017

E3S Web Conf.

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“…The RMS roughness prepared at higher substrate temperature are even higher than that of AZO thin films etched with hydrochloric acid. 20 This results could be explained as follow. At higher substrate temperatures, the grain size of Ag thin films is larger, which will increase the RMS roughness of ATO thin films.…”

Section: Resultsmentioning

confidence: 75%

Effects of substrate temperature on properties of surface textured ATO/Ag thin films prepared by magnetron sputtering

Wang

Gao

et al. 2014

Materials Technology

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The antimony doped SnO 2 (ATO) and Ag bilayer thin films are prepared on glass substrate using magnetron sputtering. The substrate temperature has a significant influence on the film microstructure, surface morphology and electro-optical characteristics. The surface morphologies of ATO/Ag are modified by changing the substrate temperature to improve the light scattering properties. At higher substrate temperatures ( §400uC), the root mean square (RMS) roughness is above 40 nm, which contributes to the significant enhancement of light scattering of ATO/Ag. When the substrate temperature is 500uC, the scattering capability of thin films, haze factor, is above 95%. Meanwhile, the resistivity of this sample is 1?22610 24 V cm, low enough to be applied as back electrode of thin film solar cells.

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“…By changing the H 2 /(Ar+H 2 ) ratio of the sputtering gas, they obtained smooth films with high transparency (T ≥ 85% in the visible range) and an extraordinary low resistivity of 2.7 × 10 −4 Ω⋅cm. The most important characteristic of the film they reported was that the electrical properties and the light-scattering properties which are good for light to be effectively trapped could be optimized separately, meaning that the film has optimistic perspectives in flexible applications [36].…”

Section: Al-dopingmentioning

confidence: 99%

Development on transparent conductive ZnO thin films doped with various impurity elements

et al. 2011

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A general review of recent research progress in fabricating transparent conductive ZnO thin films by means of intentional doping and codoping with In, Ga, Al, Mg, Li, F, H, N, and P, divided into metals and nonmetals, is presented in this article. The main emphasis is placed on introducing and discussing the recent research achievements on the mechanisms of the incorporation of these impurities, and their effects on the electrical and optical properties. Lastly, this article concludes with a summary of the present state of investigations on doping elements in fabricating functional ZnO thin films for photoelectric applications, and with our personal view of the perspective of future studies on doped ZnO thin films.

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Development of surface-textured hydrogenated ZnO:Al thin-films for μc-Si solar cells

Cited by 42 publications

References 11 publications

Influence of sputtering deposition parameters on electrical and optical properties of aluminium-doped zinc oxide thin films for photovoltaic applications

Influence of sputtering deposition parameters on electrical and optical properties of aluminium-doped zinc oxide thin films for photovoltaic applications

Effects of substrate temperature on properties of surface textured ATO/Ag thin films prepared by magnetron sputtering

Development on transparent conductive ZnO thin films doped with various impurity elements

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