We report the fine structure resolved electron impact excitation cross-sections of Si+2 from its ground state 3s2 (J = 0) to the 41 excited fine structure levels of the configurations 3s3p, 3p2, 3s3d, 3s4s, 3s4p, 3s5s, 3s4d, 3s4f, 3s5p, 3s5d and 3s5f using relativistic distorted wave theory. The excitation cross-sections from excited metastable levels (3P0,3P2) of the configuration 3s3p to higher excited levels as well as for some other dominant transitions relevant to plasma modeling are also obtained. In addition, the ionization cross-sections are evaluated from the ground and metastable levels to higher ionized state Si+3 (2S1/2). The calculated cross-sections are utilized to obtain the rate coefficients corresponding to electron impact excitation and ionization processes affecting the intensity of prominent Si+2 emission lines 379.61, 380.65, 456.78, and 457.48 nm recorded through optical emission spectroscopic measurements by Wang et al. (Phys. Plasmas 27, 063513 (2020)) on laser produced silicon plasma. Further, the rate coefficients corresponding to radiative, and three body recombination are also presented. The reported cross-sections and rate coefficients will be useful to develop rigorous collisional radiative model for the diagnostics of silicon plasma.