Diamond deposition on siliconized stainless steel

Álvarez, F.; Reinoso, M.; Huck, H.; Rosenbusch, M.

doi:10.1016/j.apsusc.2010.01.056

Cited by 5 publications

(2 citation statements)

References 32 publications

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“…Siliconization of steels has been studied previously as a way to improve hot corrosion resistance, while Alvarez et al used the similarly method to prepare silicon diffusion surface interlayers on steels [ 58 ] for diamond deposition. By coating the surface of the steels with silicon and performing diffusion treatments at 800 °C, a uniform 2 μm thick silicon rich interlayer was obtained.…”

Section: The Effective Barriers For the Internal Carburizationmentioning

confidence: 99%

Diamond Deposition on Iron and Steel Substrates: A Review

et al. 2020

Micromachines

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This article presents an overview of the research in chemical vapor deposition (CVD) diamond films on steel substrates. Since the steels are the most commonly used and cost-effective structural materials in modern industry, CVD coating diamond films on steel substrates are extremely important, combining the unique surface properties of diamond with the superior toughness and strength of the core steel substrates, and will open up many new applications in the industry. However, CVD diamond deposition on steel substrates continues to be a persistent problem. We go through the most relevant results of the last two and a half decades, including recent advances in our group. This review discusses the essential reason of the thick catalytic graphite interlayer formed on steel substrates before diamond deposition. The high carbon diffusion in iron would induce severe internal carburization, and then voluminous graphite precipitated from the substrate. In order to hinder the catalytic graphite formation, various methods have been applied for the adherent diamond film deposition, such as pre-imposed various interlayers or multi-interlayers, special controls of the deposition process, the approaches of substrate alloying and so on. We found that adherent diamond films can be directly deposited on Al alloying steel substrates, and then the role of Al alloying element was examined. That is a thin dense amorphous alumina sublayer in situ formed on the alloying substrate, which played a critical role in preventing the formation of graphite phase and consequently enhancing diamond growth and adhesion. The mechanism of Al alloying suggests that the way used to improve hot corrosion resistance is also applicable. Then, some of the hot corrosion resistance methods, such as aluminizing, siliconizing, and so on, which have been used by some researchers examining CVD diamond films on steel substrates, are reviewed. Another way is to prepare diamond-like carbon (DLC) films on steel substrates at low temperature, and then the precipitated graphite from the internal carburization can be effectively avoided. In addition, based on some new findings, the understanding of the diamond nucleation and metastable growth is discussed.

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Section: The Effective Barriers For the Internal Carburizationmentioning

confidence: 99%

Diamond Deposition on Iron and Steel Substrates: A Review

et al. 2020

Micromachines

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“…For example, Si has been used as a diffusion barrier on stainless steel. 18 On cemented-WC substrates, both homogeneous carbides 19 and graded WC layers have been investigated. 20 Other approaches have included Al, 21 W-Al bilayers, 22 and Mo 23 thin films.…”

Section: Introductionmentioning

confidence: 99%

Sputtered Tungsten-Based Ternary and Quaternary Layers for Nanocrystalline Diamond Deposition

Walock¹,

Rahil²,

Zou³

et al. 2012

j. nanosci. nanotech.

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. Many of today's demanding applications require thin-film coatings with high hardness, toughness, and thermal stability. In many cases, coating thickness in the range 2-20 m and low surface roughness are required. Diamond films meet many of the stated requirements, but their crystalline nature leads to a high surface roughness. Nanocrystalline diamond offers a smoother surface, but significant surface modification of the substrate is necessary for successful nanocrystalline diamond deposition and adhesion. A hybrid hard and tough material may be required for either the desired applications, or as a basis for nanocrystalline diamond film growth. One possibility is a composite system based on carbides or nitrides. Many binary carbides and nitrides offer one or more mentioned properties. By combining these binary compounds in a ternary or quaternary nanocrystalline system, we can tailor the material for a desired combination of properties. Here, we describe the results on the structural and mechanical properties of the coating systems composed of tungstenchromium-carbide and/or nitride. These WC-Cr-(N) coatings are deposited using magnetron sputtering. The growth of adherent nanocrystalline diamond films by microwave plasma chemical vapor deposition has been demonstrated on these coatings. The WC-Cr-(N) and WC-Cr-(N)-NCD coatings are characterized with atomic force microscopy and SEM, X-ray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy, and nanoindentation.

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