Diamond deposition technologies

Charge-based deep level transient spectroscopy of B-doped and undoped polycrystalline diamond films

“…It should be mentioned that the MP and HF CVD methods are characterized by similar growth rates of diamonds layers, i.e., the differences in the activation processes in both methods are negligible [16].…”

Synthesis and Mechanical Properties of Cubic Boron Nitride /Nanodiamond Composite Films

“…Since rough, uneven surfaces result in irregularities of the indentation imprints and faulty determination of the actual projected areas in nano-indentation measurements, the composite film (2.5 lm thick cBN over 2.5 lm thick ND) was mechanically smoothed with fine diamond lapping paper (average grain size ∼100 nm) prior to the indentation measurements. The rms surface roughness of the composite film was reduced to 9 nm when analyzed in AFM-scanned fields of 10 × 10 mm 2 . Other details of the measurements were reported in our previous work.…”

“…Diamond, a wide bandgap semiconductor, is transparent over a broad range of electromagnetic radiation, [1] and has a large refractive index of 2.4, [2] so it is particularly suitable for the construction of various optical windows and ultraviolet lenses. The extreme hardness, thermal conductivity, and chemical inertness of diamond make it useful for diverse mechanical and electronic applications.…”

Deposition of Diamond-Like Superhard Materials in the B/C/N System

“…Moreover, it is even possible to develop`reduced models' [26,27] on the basis of these basic processes which describe diamond growth qualitatively very well and in part even quantitatively. There is a vast variety of methods suitable for diamond deposition [28], the most prominent being hot-filament CVD (HFCVD) and microwave CVD (MWCVD). These techniques are mainly distinguished by the type of excitation to create a gas phase temperature T G as high as possible (b 2000 C) [3,28], whereas the other process parameters (substrate temperature 700 to 1000 C, pressure 10 to 1000 mbar, 1 to 5% of a hydrocarbon diluted in hydrogen) are common to all techniques.…”

“…There is a vast variety of methods suitable for diamond deposition [28], the most prominent being hot-filament CVD (HFCVD) and microwave CVD (MWCVD). These techniques are mainly distinguished by the type of excitation to create a gas phase temperature T G as high as possible (b 2000 C) [3,28], whereas the other process parameters (substrate temperature 700 to 1000 C, pressure 10 to 1000 mbar, 1 to 5% of a hydrocarbon diluted in hydrogen) are common to all techniques. Irrespective of the technique applied, one has to distinguish between gas phase processes, transport processes and surface processes [3,24].…”