2015
DOI: 10.1111/jace.13846
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Dielectric Properties of Pure and Gd‐Doped HfO2 Ceramics

Abstract: The pure, 2 at.%, and 20 at.% Gd‐doped HfO2 ceramics were prepared by the standard solid‐state reaction technique. Dielectric properties of these ceramics were investigated in the temperature range 300–1050 K and frequency range 20–5 × 106 Hz. Our results revealed an intrinsic dielectric constant around 20 in the temperature below 450 K for all tested ceramics. Two oxygen‐vacancy‐related relaxations R1 and R2 were observed at temperatures higher than 450 K, which were identified to be a dipolar relaxation due … Show more

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Cited by 9 publications
(4 citation statements)
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“…Note in Table that all compounds present very good loss tangent behavior from RT up to ~673 K. In particular, ITAM and ITGM compounds show values as low as 0.0066 and 0.0042 at 473 K. Note also that the dielectric loss values are below 1 between 473 and 675 K. It is well known that a good dielectric material should have a very low dielectric loss (<1). The dielectric constant values measured in these materials are similar to those obtained in binary oxides with high dielectric constant, such as ZrO 2 (κ = 25, Tan δ = 0.02), HfO 2 (κ = 25‐40, Tan δ = 0.025) and La 2 O 3 (κ = 30), which are prominent candidates for integrated circuit devices (CMOS‐FET) . Robertson et al showed that the value of a dielectric constant tends to vary inversely with the band gap.…”
Section: Resultssupporting
confidence: 64%
“…Note in Table that all compounds present very good loss tangent behavior from RT up to ~673 K. In particular, ITAM and ITGM compounds show values as low as 0.0066 and 0.0042 at 473 K. Note also that the dielectric loss values are below 1 between 473 and 675 K. It is well known that a good dielectric material should have a very low dielectric loss (<1). The dielectric constant values measured in these materials are similar to those obtained in binary oxides with high dielectric constant, such as ZrO 2 (κ = 25, Tan δ = 0.02), HfO 2 (κ = 25‐40, Tan δ = 0.025) and La 2 O 3 (κ = 30), which are prominent candidates for integrated circuit devices (CMOS‐FET) . Robertson et al showed that the value of a dielectric constant tends to vary inversely with the band gap.…”
Section: Resultssupporting
confidence: 64%
“…Recently, Wang et al reported the dielectric properties of pure and Gd-doped HfO 2 ceramics. 12 On the other hand, the HfO 2 -TiO 2 system has attracted a lot of interest, [13][14][15] owing to its extremely low thermal expansion coefficient. Tilloca reported that HfO 2 -TiO 2 ceramics had been proven to have ultralow expansion and refractory properties.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, Wang et al. reported the dielectric properties of pure and Gd‐doped HfO 2 ceramics 12 . On the other hand, the HfO 2 –TiO 2 system has attracted a lot of interest, 13–15 owing to its extremely low thermal expansion coefficient.…”
Section: Introductionmentioning
confidence: 99%
“…The intrinsic relative permittivity of HfO 2 was reported to be 18 [19], which is much smaller than CST (240). However, the addition of HfO 2 has limited effect on the dielectric properties of CST, probably due to its small concentration and special existence type as intergranular grains.…”
Section: Energy Storage Behaviorsmentioning
confidence: 99%