2011
DOI: 10.1007/s11663-011-9560-z
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Diffusion Coefficient of Tin(II) Methanesulfonate in Ionic Liquid and Methane Sulfonic Acid (MSA) Solvent

Abstract: for the electrodeposition of tin from Tin(II) methane sulfonate mixed with ionic liquid and methane sulfonate acid at room temperature was studied. Cyclic voltammetry shows redox waves of Tin(II), which proves that the electrodeposition of tin from Tin(II) methane sulfonate is a diffusion-controlled process. The diffusion coefficient of Tin(II) ions in the solvent mixture showed good agreement from both voltammetry and chronoamperometry results. The diffusion coefficient of Tin(II) in the mixture was much smal… Show more

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Cited by 8 publications
(5 citation statements)
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“…Metal electrodeposition is crucial for a variety of industrial applications, where particularly Sn has been applied as a coating due to its non-toxicity, ductility, and corrosion resistance [1]. Walsh et al [2] published an extensive investigation regarding the available information about Sn electrodeposition.…”
Section: Sn Electrodeposition In Ilsmentioning
confidence: 99%
“…Metal electrodeposition is crucial for a variety of industrial applications, where particularly Sn has been applied as a coating due to its non-toxicity, ductility, and corrosion resistance [1]. Walsh et al [2] published an extensive investigation regarding the available information about Sn electrodeposition.…”
Section: Sn Electrodeposition In Ilsmentioning
confidence: 99%
“…In the reverse potential sweep, one peak recording confirms the two electron oxidation of deposit [24,25]:…”
Section: Characteristic Of Electrodeposition Bathmentioning
confidence: 82%
“…[21][22][23] Furthermore, tin(II) methanesulfonate has been synthesized and used as precursor for tin electroplating from a bath composed of MSA and the ionic liquid 1-butyl-1-methyl-pyrrolidinium trifluoromethanesulfonate ([BMP][OTf]). 24 The prepared indium(III) methane-sulfonate was dissolved in DMSO. This solvent exhibits considerable electrochemical stability and has a boiling point of 189 1C, enabling the electrodeposition of indium above its melting point.…”
Section: Resultsmentioning
confidence: 99%