2001 IEEE MTT-S International Microwave Sympsoium Digest (Cat. No.01CH37157)
DOI: 10.1109/mwsym.2001.967331
|View full text |Cite
|
Sign up to set email alerts
|

Digitally controllable variable high-Q MEMS capacitor for RF applications

Abstract: This paper describes the novel design of an electrostatic digitally controllable variable MEMS capacitor constructed using Cronos MUMPS technology and flipchip technology processing. The capacitor consists of an array of individual plates of equal area, which are connected to the bonding pads by springs of varying width. This creates a cascading snap-down effect when actuated by electrostatic forces. The capacitor has a measured Qfactor of 140 at 750MHz, and a tuning ratio of 4 1 .other digitally controlled ca… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

0
19
0

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 31 publications
(19 citation statements)
references
References 5 publications
0
19
0
Order By: Relevance
“…Q values of 104 and 145 at about 745 MHz have been reported [16]. The tuning ratio of the capacitor is 4:1 [6].…”
Section: A Mems Variable Capacitorsmentioning
confidence: 94%
See 2 more Smart Citations
“…Q values of 104 and 145 at about 745 MHz have been reported [16]. The tuning ratio of the capacitor is 4:1 [6].…”
Section: A Mems Variable Capacitorsmentioning
confidence: 94%
“…A digitally-controllable variable capacitor has been reported in [6]. This capacitor is mounted and measured in a TEM-mode coax-rectangular resonator [16].…”
Section: A Mems Variable Capacitorsmentioning
confidence: 99%
See 1 more Smart Citation
“…However, the latter suffers from low self-resonance. In [4] and [5], an array of parallel-plate capacitors with different beam sizes that demonstrates a tuning range of 370% has been proposed. A twomovable-plates MEMS variable capacitor with a nitride layer between the two plates has been proposed in [1].…”
Section: Introductionmentioning
confidence: 99%
“…The advancement in micromachining technologies in the last twenty years has introduced the new class of microelectromechanical (MEMS) varactors. 35,36 However, the development of MEMS varactors has not progressed at the pace of other MEMS devices, which can be explained by the abundance of discrete high quality factor silicon and GaAs varactors up to 30 GHz. 37 But there is still a pressing need for electromechanical varactors including the novel NEMS varactors: they have the potential of very high quality factors, they can be designed to withstand large radio frequency (rf) voltage swings, they exhibit a symmetric capacitance-voltage (C-V) response, and they can be inexpensively produced on top of high-resistivity silicon substrates.…”
mentioning
confidence: 99%