The layer-by-layer nature of ALD allows precise control of surface composition in the growth direction normal to the surface. However, it is harder to control the amount of material incorporated during a single ALD cycle. Recently, we demonstrated an approach based on incorporating an in-situ surface functionalization step into each ALD cycle.[1] This step essentially controls the amount of reactive sites on the surface, ideally modulating the saturation coverage while maintaining the self-limiting surface chemistry. In this work we present in-situ surface and gas phase Fourier transform infrared spectroscopy studies for Al 2 O 3 ALD using exposures to ethanol (EtOH), trimethyl aluminum (TMA), and H 2 O. Our results showed that the TMA surface coverage was reduced with respect to the conventional TMA/H 2 O case. We also found that a fraction of the adsorbed EtOH was removed during the TMA dose, and we identified dimethyl aluminum ethoxide as a reaction byproduct. Our results are consistent with a mechanism in which a fraction of the adsorbed ethoxides is displaced through ligand exchange with TMA, leaving methyl groups on the surface.