2018
DOI: 10.1016/j.carbon.2017.12.097
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Direct CVD growth of graphene on three-dimensionally-shaped dielectric substrates

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Cited by 30 publications
(10 citation statements)
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“…For instance, a Cu foil was placed between two 3D hemisphere-patterned sapphire substrates to facilitate the deposition of uniform and highquality 2−3-layer graphene on the 3D sapphire. 826 An intimate contact of the Cu foil and the sapphire substrates was the key to a conformal coating of few-layer graphene. Without the assistance of the Cu foil, only amorphous carbon was resulted.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…For instance, a Cu foil was placed between two 3D hemisphere-patterned sapphire substrates to facilitate the deposition of uniform and highquality 2−3-layer graphene on the 3D sapphire. 826 An intimate contact of the Cu foil and the sapphire substrates was the key to a conformal coating of few-layer graphene. Without the assistance of the Cu foil, only amorphous carbon was resulted.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…Graphene is a nanomaterial that has a monolayer structure with a hexagonal honeycomb lattice composed of carbon atoms in sp 2 hybrid orbits, which has extraordinary physical and chemical properties . The main preparation methods of graphene are mechanical exfoliation, chemical vapor deposition (CVD) and oxidation‐reduction method . Among these methods, the mechanical exfoliation can not be synthesized in a large scale.…”
Section: Introductionmentioning
confidence: 99%
“…A single-layer Gr synthesized by chemical vapor deposition (CVD) was subsequently wet transferred onto the SiO 2 film. 22 Finally, a near-percolation Au film with a thickness of 8 nm was obtained by using low deposition rate of 0.2 Å s −1 during the Au thermal evaporation process. The wavelength (λ), pulse duration, and repetition rate of the fs-laser beam in operation were 520 nm, 250 fs, and 500 kHz, respectively.…”
Section: Methodsmentioning
confidence: 99%