2020
DOI: 10.1088/1361-6528/ab9b49
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Direct growth of germanium nanowires on glass

Abstract: We report a detailed characterization of Ge NWs directly grown on glass by a MOVPE system, showing how different growth parameters can affect the final outcome and comparing NWs grown on a monocrystalline Ge(111) substrate with NWs grown on amorphous glass. Our experimental results indicate that the choice of the substrate does not affect any of the relevant morphological, crystallographic or electrical properties of Ge NWs. Lengths are in the 20-30 micrometer range with minimal tapering, while growth rates ar… Show more

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Cited by 3 publications
(5 citation statements)
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References 29 publications
(41 reference statements)
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“…Moreover, it is noteworthy to mention that even though Ge NWs grown for this study are nominally undoped, it is well known that the presence of acceptor-like trap levels on Ge NW gives rise to the hole accumulation at the surface of NW [ 29 31 ]. In support to this hypothesis, in our previous investigations we observed that single Ge NW, obtained under the same growth conditions of NW structures studied in this work and contacted by focused ion beam (FIB)-deposited platinum [ 25 ], showed a p-type field effect behaviour. As a consequence, the semiconductor–metal contact formation at the electrodes and the conduction mechanisms through NW networks can be properly discussed assuming the p-type character for Ge NWs .…”
Section: Resultssupporting
confidence: 83%
See 1 more Smart Citation
“…Moreover, it is noteworthy to mention that even though Ge NWs grown for this study are nominally undoped, it is well known that the presence of acceptor-like trap levels on Ge NW gives rise to the hole accumulation at the surface of NW [ 29 31 ]. In support to this hypothesis, in our previous investigations we observed that single Ge NW, obtained under the same growth conditions of NW structures studied in this work and contacted by focused ion beam (FIB)-deposited platinum [ 25 ], showed a p-type field effect behaviour. As a consequence, the semiconductor–metal contact formation at the electrodes and the conduction mechanisms through NW networks can be properly discussed assuming the p-type character for Ge NWs .…”
Section: Resultssupporting
confidence: 83%
“…Ge nanowires were grown using an Au-catalysed chemical vapour deposition process with no intentional doping. Details of Metal Organic Vapour Phase Epitaxy (MOVPE) technique can be found in earlier works [ 24 , 25 ]. Crystalline as-grown nanowires have diameters ranging from 70 to 90 nm and lengths up to 30 µm.…”
Section: Methods/experimentalmentioning
confidence: 99%
“…In order to validate the simulation of properties of Ge NWs modeled as discussed above, as a first step we carried on a calculation considering the nanostructures characterized in [ 32 ]. Hence, we calculated the I–V characteristic for a Ge NW with same morphological properties (95 nm diameter, 9.6 µm length) and with electrical contacts 2 µm long on both sides of the NW.…”
Section: Model Detailsmentioning
confidence: 99%
“…We run the same simulation for different voltage biases applied to the contacts at the end of the NW, aiming to derive the I–V characteristic in the range between 0 and 0.1 V. The results are shown in Figure 3 , where they are plotted against the experimental data taken from [ 32 ].…”
Section: Model Detailsmentioning
confidence: 99%
“…Many nanowire synthesis methods have been proposed and intensively studied, to obtain desired nanowire structures at high precision and efficiency. In particular, the VLS method, as one of the bottom-up synthesis routes, has realized a variety of new materials and morphologies including Ge NWs, with good control over the material’s physical and chemical properties. A typical VLS process for catalyzed semiconductor growth can be described as follows: a heated metal catalyst and the gaseous precursor first form a liquid alloy, which has a high adhesion capacity to facilitate further material absorption from the gas phase. When the supersaturated state of the liquid is reached, the target material is extracted and then deposits on the liquid–solid interface, leading to a bottom-up continuous growth of the wire.…”
Section: Introductionmentioning
confidence: 99%