Direct laser writing of high-NA computer-generated holograms on metal films of the titanium group and chromium

Korolkov, V. P.; Насыров, Р. К.; Sametov, Alaxander R.; Malyshev, A. I.; Belousov, Dmitrij A.; Mikerin, S. L.; Kuts, Roman I.

doi:10.1117/12.2537269

Cited by 2 publications

(2 citation statements)

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“…As a recording material for thermochemical laser technology, as a rule, chromium films are used, but other metal film coatings can also be applied. In particular, the use of titanium films [15][16][17][18] and titanium group metals [14,[19][20][21] is currently being actively investigated. This is mainly due to the fact that, with localized laser heating of Ti films, it is possible to realize the through oxidation mode, which is not available for chromium films.…”

Section: Introductionmentioning

confidence: 99%

Direct Laser Writing of Diffractive Structures on Bi-Layer Si/Ti Films Coated on Fused Silica Substrates

et al. 2023

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This paper presents the results of an investigation of direct laser writing on a titanium film with an antireflection capping silicon coating. Bi-layer films were deposited on fused silica substrates using an e-beam evaporation system. Modeling predicted that optical absorption for a bi-layer Si/Ti material can be increased by a factor of ~2 compared to a single-layer Ti film at 532 nm laser writing beam wavelength. It is experimentally proved that rate of thermochemical laser writing on Si/Ti films is at least 3 times higher than that on a single-layer Ti film with comparable thickness. The silicon layer was found to participate in the thermochemical reaction (silicide formation) under laser beam heating, which allows one to obtain sufficient position-dependent phase change (PDPC) of light reflected from exposed and unexposed areas. This results in much larger profile depth measured with a white light interferometer (up to 150 nm) than with an atomic force microscope (up to 25 nm). During direct laser writing on Si/Ti films, there is a broad range of writing beam power within which the PDPC and reflection coefficient for the exposed areas change insignificantly. The possibility of selective development of a thermochemically written pattern on a Ti film by removing the capping silicon layer on unexposed areas in a hot KOH solution is shown.

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Section: Introductionmentioning

confidence: 99%

Direct Laser Writing of Diffractive Structures on Bi-Layer Si/Ti Films Coated on Fused Silica Substrates

et al. 2023

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“…Methods based on the thermochemical technology of local laser oxidation have a significant applied potential in this situation. Thus, through oxidation of titanium films [9] allows obtaining a change in transmittance at least 10 times, but this dependence is not monotonic (Fig. 1) and the process is limited by the scanning speed of about 200 cm/sec.…”

Section: Methods For Making Dpps With Changing Film Thicknessesmentioning

confidence: 99%

Thermochemical laser writing of chromium grayscale masks and their application for fabrication of multilevel diffractive optical elements

Kuts,

Korolkov,

Sametov

et al. 2023

Holography, Diffractive Optics, and Applications XIII

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The paper presents the results of developing a technology for direct laser writing of grayscale photomasks on thin (30-50 nm) chromium films. The contrast of grayscale microimages reaches 10, which is comparable to the characteristics of LDW-glass. The technique is based on dependence of chromium oxide layer thickness formed at laser heating on exposure dose. The oxide layer is then used as a analog mask for underlaying Cr film. The written grayscale masks are used to fabricate multilevel diffractive optical elements by the method of grayscale lithography. The photoresist layer was exposed by contact printing through the grayscale mask. Diffractive optical elements with a sawtooth profile depth in the range of 1-4 μm are made. The angle of the backward slope of the diffractive zones was 60 degrees. The article discusses examples of the use of chromium grayscale masks for fabrication of various 3D structures.

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Direct laser writing of high-NA computer-generated holograms on metal films of the titanium group and chromium

Cited by 2 publications

References 9 publications

Direct Laser Writing of Diffractive Structures on Bi-Layer Si/Ti Films Coated on Fused Silica Substrates

Direct Laser Writing of Diffractive Structures on Bi-Layer Si/Ti Films Coated on Fused Silica Substrates

Thermochemical laser writing of chromium grayscale masks and their application for fabrication of multilevel diffractive optical elements

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