2008
DOI: 10.1016/j.jallcom.2007.04.219
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Direct synthesis and characterization of single-phase tantalum nitride (Ta2N) nanocrystallites by dc arc discharge

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Cited by 13 publications
(4 citation statements)
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References 18 publications
(17 reference statements)
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“…In our experiments, it is found that the reaction time and N 2 pressure play important roles in the formation of the AlN pine-shaped nanostructure. Generally speaking, the optimal conditions for nucleation are low N 2 pressure (5−20 kPa) and short reaction time (10−30 min) for the synthesis of other nitride nanomaterials, and the synthesized nitrides are mostly nanoparticles. To find novel nanostructures, we increase the N 2 pressure and the reaction time simultaneously.…”
Section: Resultsmentioning
confidence: 99%
“…In our experiments, it is found that the reaction time and N 2 pressure play important roles in the formation of the AlN pine-shaped nanostructure. Generally speaking, the optimal conditions for nucleation are low N 2 pressure (5−20 kPa) and short reaction time (10−30 min) for the synthesis of other nitride nanomaterials, and the synthesized nitrides are mostly nanoparticles. To find novel nanostructures, we increase the N 2 pressure and the reaction time simultaneously.…”
Section: Resultsmentioning
confidence: 99%
“…On the other hand, the N 2 pressure gradually decreased with the increase of the reaction time during the synthetic process. Generally speaking, the optimal conditions for nucleation for the synthesis of other nitride nanomaterials are low N 2 pressure (5−20 kPa) and short reaction time (10−30 min) and the nitrides synthesized are mostly nanoparticles. , However, in this experiment, only AlN nanowires were obtained when the N 2 pressure, voltage, current, and reaction time are 30 kPa, 30 V, 80 A, and 10 min, respectively. To obtain novel nanostructures, we increased the N 2 pressure and the reaction time simultaneously.…”
Section: Resultsmentioning
confidence: 79%
“…The synthesis was carried out in an improved direct arc discharge plasma setup. , In a typical run, aluminum (purity 99.999%) metal and N 2 gas (purity 99.999%) were used as aluminum and nitrogen sources, respectively. This novel morphology was found in the sample produced by direct nitrification of the aluminum metal in DC arc plasma with N 2 as the working medium.…”
Section: Methodsmentioning
confidence: 99%
“…11) Tantalum nitride thin films can be prepared on Si substrates by reactive pulsed DC magnetron sputtering. 12) Herein, we report a novel approach to synthesize Ta 2 N nanostallines by a one-step chemical reaction of metallic magnesium, tantalum pentoxide, and ammonium chloride at 650 °C. Tantalum pentoxide, as a tantalum source, has the advantages of wide source, low price and easy operation.…”
mentioning
confidence: 99%