Direct write lithography: the global solution for R&D and manufacturing

Influence of hybrid organic–inorganic sol–gel matrices on the photophysics of amino-functionalized UV-sensitizers

“…The fabrication of 3D microstructures has become possible with the recent development of the 2PP technique [2,4,13,14], which exploits the multiphoton absorption of materials that are primarily UV-sensitive. The beam of an ultrafast laser, usually a femtosecond laser, operating in the visible or near infrared region, is tightly focused into the volume of a UV-photoreactive material.…”

“…Photocurable materials have attracted great interest over the past decade for micro/nanofabrication processes of two-and three-dimensional (3D) microstructures employing techniques such as UV-lithography [1][2][3] and twophoton polymerization (2PP) [4,5]. The applications of such microstructures are constantly expanding and to date they have found use in fields as diverse as biotechnology [6], nanomedicine [7], information technology (e.g.…”

Top‐Down Approaches to the Fabrication of Nanopatterned Electrodes

“…Because of its very high resolution and flexibility, EBL it is now widely used in many universities and research institutes for nanoscale patterning [24]. The use of this technology has become popular in recent years for the fabrication of nanoelectrodes.…”

“…The technique is based on the high-resolution etching of substrate materials using a finely focused beam of electrons. Because of its short electron wavelength, e-beam writing is not diffractionlimited, allowing resolution down to the nanometer range [24]. EBL can be applied to nanoelectrode preparation by using either direct or indirect pattern techniques, and can also be used in combination with other techniques such as nanoimprint lithography.…”

Design of nano-lithographic system based on phase photon sieve

“…Some researches have been done to provide low-cost, high resolution lithographic techniques [1][2][3][4][5][6][7][8], hence some novel lithographic techniques came forth. Most of these novel techniques were maskless lithography for its own special merits.…”