A fast and simple technique that produces self-aligned gold nanoparticles on a silicon substrate, covering a large area, is described. This technique involves three consecutive steps: first, the substrate is laser-irradiated to produce a periodic nanorippled structure; second, a thin film of gold is grown using ion-beam sputter deposition; and third, a thermal treatment is conducted to produce the formation and self-alignment of nanoparticles. The nanoparticles form along strips parallel to the nanoripple lines. The strip spacing equals the nanoripple spacing and the strip width depends on the angle of deposition and the divergence of the ion beam. The nanoparticle diameter is a function of the annealing temperature and time. It was found that deposition of the film at a very shallow grazing angle (0 • ) induces, upon thermal annealing in air at 800 • C, the formation of single nanoparticle rows aligned along the ripple ridges. In order to obtain the single-particle lines, a beam collimator, aimed at reducing the angular spread of the incident ion beam, was employed during deposition.This technique is general and could be used in a large number of substrate/film combinations. Studies of other substrates would provide optimum conditions to obtain similar results, as laser-induced periodic structures are a fairly universal phenomenon.