2007
DOI: 10.1109/tpel.2007.904241
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Distributed Modeling of Layout Parasitics in Large-Area High-Speed Silicon Power Devices

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Cited by 23 publications
(11 citation statements)
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“…The effective resistances required by Equation 1 are then determined by solving the matrix equation that results. This process is similar to that outlined in [14].…”
Section: Layout To Device Parasitic Parameterssupporting
confidence: 56%
“…The effective resistances required by Equation 1 are then determined by solving the matrix equation that results. This process is similar to that outlined in [14].…”
Section: Layout To Device Parasitic Parameterssupporting
confidence: 56%
“…The simulated device is a silicon power MOSFET, which was calibrated according to the prototype developed by ST microelectronics [1]. The device is powered by means of parallel fingers which are placed at a distance of 2.4µm.…”
Section: Simulation Methodologymentioning
confidence: 99%
“…Large area power MOSFETs are typically affected by non-uniformity of biasing, due to the delay in signal propagation [1]. This phenomenon causes a dependence of the self-heating effects on the device position.…”
Section: Introductionmentioning
confidence: 99%
“…Many layout styles, including multi-fingers, waffle, overlapping circular gate, wave, and diamond styles have been developed. However, the uniform distribution of the load current is still difficult to guarantee [ 9 ]. Figure 1 shows an infrared thermal photograph of a 45 V N-type power MOS with a power dissipation of 1 W. The temperature at the substrate ring is 53.3–55.2 °C, and that at the top metal above the transistor channel is 42.4–46.1 °C.…”
Section: Introductionmentioning
confidence: 99%