Organic photodiode integration on
the Si readout circuit offers
a solution for extending the sensitivity beyond 1000 nm. In this work,
we report the way to integrate organic photodiodes on Si substrates
with metals that are complementary metal–oxide–semiconductor
process-compatible as bottom electrodes, such as titanium nitride
(TiN), tungsten (W), and aluminum (Al). We report on a high-efficiency
near-infrared sensor enabled by employing TiN and W as bottom electrodes,
with an external quantum efficiency of ∼50% at 940 nm and ∼70%
at 1030 nm, a dark leakage current density of 15 nA/cm2, a bandwidth of 15 kHz at −4 V, and a dynamic range of ∼100
dB. Low resistivity and inert properties of TiN make it form a good
interface with the organic active layer, leading to an ideal bottom-contact
metal for the organic photodiode when integrated on the Si substrate.