DOS and electron attachment effects in the electron-induced vibrational excitation of terphenylthiol SAMs

Houplin, J.; Amiaud, L.; Dablemont, Céline; Lafosse, A.

doi:10.1039/c5cp04067a

Cited by 5 publications

(12 citation statements)

References 39 publications

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“…There is additional information that could be obtained from detailed HREELS studies. In particular, the evolution of the vibrational signatures with the incident energy of the probing electron beam can be used to find resonance energies for electron attachment [ 42 ]. Such energies can be probed to better understand the key role of DEA process in precursor decomposition under electron beams.…”

Section: Discussionmentioning

confidence: 99%

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Sala¹,

Szymańska²,

Dablemont³

et al. 2018

Beilstein J. Nanotechnol.

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Background: Focused electron beam induced deposition (FEBID) allows for the deposition of free standing material within nanometre sizes. The improvement of the technique needs a combination of new precursors and optimized irradiation strategies to achieve a controlled fragmentation of the precursor for leaving deposited material of desired composition. Here a new class of copper precursors is studied following an approach that probes some surface processes involved in the fragmentation of precursors. We use complexes of copper(II) with amines and perfluorinated carboxylate ligands that are solid and stable under ambient conditions. They are directly deposited on the surface for studying the fragmentation with surface science tools. Results: Infrared spectroscopy and high-resolution electron energy loss spectroscopy (HREELS) are combined to show that the precursor is able to spontaneously lose amine ligands under vacuum. This loss can be enhanced by mild heating. The combination of mass spectrometry and low-energy electron irradiation (0–15 eV) shows that full amine ligands can be released upon irradiation, and that fragmentation of the perfluorinated ligands is induced by electrons of energy as low as 1.5 eV. Finally, the cross section for this process is estimated from the temporal evolution in the experiments on electron-stimulated desorption (ESD). Conclusion: The release of full ligands under high vacuum and by electron irradiation, and the cross section measured here for ligands fragmentation allow one to envisage the use of the two precursors for FEBID studies.

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Section: Discussionmentioning

confidence: 99%

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Sala¹,

Szymańska²,

Dablemont³

et al. 2018

Beilstein J. Nanotechnol.

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“…36 Irradiation of p-terphenylthiol SAMs with LEEs was found to show a resonance centered at 7.2 eV for excitation of carbon− hydrogen bonds. 37,38 From these results, we conclude that at energies in the range from 0 eV up to about 10 eV, the incoming electrons can attach to the pentacene molecules; however, toward the lower end of the range, the molecules most probably autodetach the extra electron, and the temporary attachment is much less likely to lead to fragmentation of the molecule. Toward the upper end of the 0−10 eV range, electron attachment will leave the molecule in a chemically reactive state with consequences that are discussed further below.…”

Section: ■ Discussionmentioning

confidence: 86%

“… 36 Irradiation of p -terphenylthiol SAMs with LEEs was found to show a resonance centered at 7.2 eV for excitation of carbon–hydrogen bonds. 37 , 38 …”

Section: Discussionmentioning

confidence: 99%

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Low-Energy Electron Irradiation Damage in Few-Monolayer Pentacene Films

et al. 2021

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Crystalline films of pentacene molecules, two to four monolayers in thickness, are grown via in situ sublimation on silicon substrates in the ultrahigh vacuum chamber of a low-energy electron microscope. It is observed that the diffraction pattern of the pentacene layers fades upon irradiation with low-energy electrons. The damage cross section is found to increase by more than an order of magnitude for electron energies from 0 to 10 eV and by another order of magnitude from 10 to 40 eV. Close to 0 eV, damage is virtually nil. Creation of chemically reactive atomic centers after electron attachment or impact ionization is thought to trigger chemical reactions between neighboring molecules that gradually transform the layer into a disordered carbon nanomembrane. Additionally, diminishing spectroscopic features related to the unoccupied band structure of the layers, accompanied by loss of definition in real-space images, and an increase in the background intensity of diffraction images during irradiation point to chemical changes and formation of a disordered layer.

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“…The interactions between aromatic SAMs and electrons have been studied by X-ray photoelectron spectroscopy (XPS), near-edge X-ray-absorption fine-structure (NEXAFS) technique [ 43 – 49 ], infrared spectroscopy [ 43 , 50 – 52 ], high-resolution electron energy loss spectroscopy (HREELS) [ 53 – 54 ], Raman spectroscopy [ 55 ], and low-energy electron microscopy (LEEM) [ 56 ] as well as by theoretical analysis [ 57 – 59 ]. It is now well established that electron irradiation leads to cleavage of C–H and S–H bonds, followed by the formation of C–C bonds between neighboring aromatic molecules.…”

Section: Introductionmentioning

confidence: 99%

Investigation of electron-induced cross-linking of self-assembled monolayers by scanning tunneling microscopy

Stohmann¹,

Koch²,

Yang³

et al. 2022

Beilstein J. Nanotechnol.

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Ultrathin membranes with subnanometer pores enabling molecular size-selective separation were generated on surfaces via electron-induced cross-linking of self-assembled monolayers (SAMs). The evolution of p-terphenylthiol (TPT) SAMs on Au(111) surfaces into cross-linked monolayers was observed with a scanning tunneling microscope. As the irradiation dose was increased, the cross-linked regions continued to grow and a large number of subnanometer voids appeared. Their equivalent diameter is 0.5 ± 0.2 nm and the areal density is ≈1.7 × 1017 m−2. Supported by classical molecular dynamics simulations, we propose that these voids may correspond to free volumes inside a cross-linked monolayer.

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DOS and electron attachment effects in the electron-induced vibrational excitation of terphenylthiol SAMs

Cited by 5 publications

References 39 publications

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Low-Energy Electron Irradiation Damage in Few-Monolayer Pentacene Films

Investigation of electron-induced cross-linking of self-assembled monolayers by scanning tunneling microscopy

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