2009
DOI: 10.1109/jmems.2008.2011703
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Double-Exposure Grayscale Photolithography

Abstract: Three-dimensional (3D) photoresist structures may be realized by controlling the transmitted UV light intensity in a process termed gray-scale photolithography.Light modulation is accomplished by diffraction through sub-resolution pixels on a photomask. The number of photoresist levels is determined by the number of different pixel sizes on the mask, which is restricted by mask fabrication. This drawback prevents the use of gray-scale photolithography for applications that need a high vertical resolution.The d… Show more

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Cited by 41 publications
(15 citation statements)
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“…The grayscale lithography is achieved via dose modulation for patterning the photonic device with vertical resolution of B10 nm. Note that although similar processes are employed in the fabrication of diffractive optical elements, micro-electro-mechanical structures and lower contrast gradedindex lenses [21][22][23][24][25] with relatively weak height variations of 80 nm over distances of tens of microns, in our case, the process enables strong height variations of 400 nm over less than 1 mm while maintaining precise control of both the resist height profile on the nanometre scale. Figure 3 shows the grayscale patterned device with a smooth surface profile in Si.…”
Section: Resultsmentioning
confidence: 99%
“…The grayscale lithography is achieved via dose modulation for patterning the photonic device with vertical resolution of B10 nm. Note that although similar processes are employed in the fabrication of diffractive optical elements, micro-electro-mechanical structures and lower contrast gradedindex lenses [21][22][23][24][25] with relatively weak height variations of 80 nm over distances of tens of microns, in our case, the process enables strong height variations of 400 nm over less than 1 mm while maintaining precise control of both the resist height profile on the nanometre scale. Figure 3 shows the grayscale patterned device with a smooth surface profile in Si.…”
Section: Resultsmentioning
confidence: 99%
“…Theoretical calculation 13 presents that three dimension (3D) periodic structures show an extremely obvious enhancement effect on the LEDs light extraction efficiency. Meanwhile, the low throughput or high cost are associated with the techniques such as the direct laser writing, 14,15 the laser interference lithography, 16 and gray exposure, 17,18 which limits the large-scale industrial production. As we know, the large area and uniform microstructures can be obtained by ultraviolet (UV) or extreme ultraviolet (EUV) lithography with low cost and high throughput.…”
Section: Introductionmentioning
confidence: 99%
“…Depending on the properties of the photoresist and available exposure dose values, different structure depths (also called grey levels) can be achieved. For achieving greyscale structures, several photolithography methods like multiple-step exposure, pixelated mask exposure and direct writing can be used [1].…”
Section: Introductionmentioning
confidence: 99%