Dynamic Simulation of Electron-Beam-Induced Chargingup of Insulators

Kotera, Masatoshi; Yamaguchi, Kazuyuki; Suga, Hiroshi

doi:10.1143/jjap.38.7176

Cited by 44 publications

(32 citation statements)

References 12 publications

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“…The description is macroscopic, and only electrons are considered. Several versions of the model are available in [11][12][13]. The advantages of this description are its simplicity, and the possibility to experimentally determine most of the parameters.…”

Section: Theoretical Background and Evidence Of Bipolar Processesmentioning

confidence: 99%

Charge transport modelling in electron-beam irradiated dielectrics: a model for polyethylene

Roy¹,

Baudoin²,

Griseri³

et al. 2010

J. Phys. D: Appl. Phys.

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This paper proposes a numerical model for describing charge accumulation in electron-beam irradiated low density polyethylene. The model is bipolar, and based on a previous model dedicated to space charge accumulation in solid dielectrics under electrical stress. It encompasses the generation of positive and negative charges due to the electron beam and their transport in the insulation. A sensitivity analysis of the model to parameters specific to electron beam irradiation is performed in order to understand the impact of each process on the space charge distribution. At last, a direct comparison between time dependent space charge distribution issued from the model and from measurements is performed. The transport parameters used for the simulations are the same as those optimized for transportation in polyethylene under an external electric field giving a robustness in the modelling approach because of the constrains on fitting parameters that must comply to a set of experimental results.PACS Numbers: 72.20Ht, 72.20Jv 1. Introduction Solid dielectrics used as thermal blanket on geostationary satellites are submitted to the flow of several types of charged particles, and particularly to electrons. These materials can accumulate charges, building up the potential inside the dielectric, meaning a potential difference between different parts of the satellite. Electrostatic Surface Discharge (ESD) can occur, leading to possible damages of the electronics of the satellite [1]. In order to prevent such ESD to happen, it is necessary to understand the dynamics of the charge transport in solid dielectrics used in space environment. A number of studies have been carried out in this domain. Some are experimental, measuring the surface potential of the irradiated samples, the current flow during irradiation [2] and the space charge distribution after irradiation [3]. Recently, two original set-ups [4-5] to measure space charge distribution in electronbeam irradiated samples have been developed on the basis of the Pulsed Electro-Acoustic (PEA) method. With these experimental tools, it is now possible to observe the dynamic of charging and discharging in electron-beam irradiated materials. On the other hand, a number of works on theoretical background and simulation has been done in order to understand and reproduce the behaviour of charge in electron beam irradiated polymers [6][7][8][9]. Our very aim is to develop space charge modelling in electron beam irradiated materials in nonstationary conditions through an approach that closely associates experiment and numerical simulation. Within the first part of this paper, we briefly review the state-of-the-art on modelling charge transport in synthetic insulations under electron beam irradiation in order to establish the position of our approach. Then, we describe the proposed model, which has been adapted from a previous one [10] developed for space charge conduction in a Low Density Polyethylene (LDPE) under DC stress. The same set of transport parameters has b...

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Section: Theoretical Background and Evidence Of Bipolar Processesmentioning

confidence: 99%

Charge transport modelling in electron-beam irradiated dielectrics: a model for polyethylene

Roy¹,

Baudoin²,

Griseri³

et al. 2010

J. Phys. D: Appl. Phys.

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“…In this study, elastic scattering, inner-shell electron ionization and longitudinal phonon excitation are considered for electron phenomena occurred in the poly methyl methacrylate (PMMA) resist. 17,18 In Si wafer, elastic scattering, inner-shell ionization, conduction band electron ionization, bulk plasmon excitation and its decay are considered. 19 In the simulation procedure, first, the resist is divided into virtual cells with the size of 5 ϫ 5 ϫ 5 nm.…”

Section: Simulation Results and Discussionmentioning

confidence: 99%

Impacts of 30-nm-thick resist on improving resolution performance of low-energy electron beam lithography

Yoshizawa¹,

Moriya²,

Oguni³

et al. 2004

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…The single scattering model [1] was used to calculate the absorbed energy distribution, a model of secondary electron production [13] was used to determine the deposited charge distribution.…”

Section: Simulation Modelmentioning

confidence: 99%

“…A positive charge was deposited at the position where a secondary electron was generated, and a negative charge was deposited at the position where an electron stops in the sample. The charge drift in the sample was simulated by taking into account the Poisson equation, the charge continuity equation, Ohm's law, and the radiation-induced conductivity [13,17,18]. Figure 7 shows the surface potential distribution of the PMMA resist on a Si substrate during electron exposure at 0.…”

Section: Charging Effectmentioning

confidence: 99%

Multiphysics Simulation of Nanopatterning in Electron Beam Lithography

Yasuda

Tada

Kotera

2016

J. Photopol. Sci. Technol.

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Multiphysics simulations are performed to analyze the pattern formation process in electron beam lithography (EBL). The simulations consist of a Monte Carlo simulation of electron scattering and molecular dynamics simulation. Some issues encountered in EBL such as electron irradiation defects, resist heating effects and charging effects on pattern formation are studied using the simulations. The simulations revealed shrinkage of the electron-exposed resist surface, the change of pattern edge caused by rising temperature and the shift of electron beam landing position induced by a charging effect. Atomic-scale information on pattern structure and stress distribution in EBL are also discussed.

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Dynamic Simulation of Electron-Beam-Induced Chargingup of Insulators

Cited by 44 publications

References 12 publications

Charge transport modelling in electron-beam irradiated dielectrics: a model for polyethylene

Charge transport modelling in electron-beam irradiated dielectrics: a model for polyethylene

Impacts of 30-nm-thick resist on improving resolution performance of low-energy electron beam lithography

Multiphysics Simulation of Nanopatterning in Electron Beam Lithography

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