EELS investigation of thin epitaxial NiO/Ag(001) films: surface states in the multilayer, monolayer and submonolayer range

“…But, lattice mismatch between the film and the substrate produces stress at the interface in pseudomorphic films. Thus, dislocations are introduced for films thicker than a critical thickness to relax the structure and minimize energy [31]. For NiO films, misfit dislocations with {1 1 0} glide planes occurs for coverage larger than 5 ML [32,33] resulting in mosaic formations within the film.…”

Section: Leed Studiesmentioning

confidence: 99%

A revisit to ultrathin NiO(001) film: LEED and valence band photoemission studies

Das

Menon

2015

Journal of Electron Spectroscopy and Related Phenomena

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“…Other work on NiO/Ag(001) concentrated on more local effects in the oxide films by using X-ray absorption spectroscopy, [9 -12] on the electronic structure by photoelectron spectroscopy [13 -15] and electron energy loss spectroscopy. [16] The influence of the oxygen dosing on structure and composition has been studied by means of various surface-sensitive techniques. [17] More recently, the electronic structure of the film including the nature of the interface has been theoretically explored.…”

Section: Introductionmentioning

confidence: 99%

The growth of thin NiO films on Ag(001) studied by scanning tunneling microscopy and spectroscopy

Großer

Hagendorf

Neddermeyer

et al. 2008

Surface & Interface Analysis

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We have used scanning tunneling microscopy and spectroscopy to study the growth of NiO films on Ag(001) at a coverage of 1.5 monolayers. The films have been obtained by reactive deposition of Ni in O-2 atmosphere. Particular attention has been paid to the development of the growth morphology of the deposit as a function of substrate and annealing temperature. For room temperature deposition, the Ag(001) surface is completely covered with the (2 x 1) NiO precursor structure with a thickness of one monolayer and small double-layer NiO islands. The Ag(001) substrate surface is nearly unaffected. Subsequent annealing leads to drastic changes of the morphology of the film. The (2 x 1) precursor structure gradually disappears with annealing time and transforms to double-layer NiO islands. One part of these NiO islands is embedded in the initially flat Ag substrate, and additional Ag islands appear on the surface. Local I/U characteristics (1: tunneling current, U: tunneling bias) have been measured on each kind of island and we found characteristic differences for the various parts of the surface, e.g. for Ag, the (2 x 1) precursor, double-layer and trilayer NiO. These differences can be used to directly map the individual species on the surface

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EELS investigation of thin epitaxial NiO/Ag(001) films: surface states in the multilayer, monolayer and submonolayer range

Cited by 43 publications

References 26 publications

Formation of Boron‐Based Films and Boron Nitride Layers by CVD of a Boron Ester

Formation of Boron‐Based Films and Boron Nitride Layers by CVD of a Boron Ester

A revisit to ultrathin NiO(001) film: LEED and valence band photoemission studies

The growth of thin NiO films on Ag(001) studied by scanning tunneling microscopy and spectroscopy

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