Effect of an external magnetic field on the morphology and magnetic properties of CoFe nanostructures

Abstract

The effect of an external magnetic field with a flux density of 0.2 T and different configurations relative to the plane of the sample (normal‐to and in‐plane) on the nucleation and growth of CoFe nanostructures has been investigated. CoFe nanostructures were grown on N‐type Si (111) substrate using an e‐beam evaporation system. The samples were subjected to an external magnetic field of 2 T normal‐to and in‐plane to the plane of the samples during the growth period. The influence of the magnetic field on the morphology of the CoFe nanostructures was studied using atomic force microscopy and scanning electron microscopy. Significant changes in the structural characteristics due to the influence of the magnetic fields were evident. Further, the influence of the external magnetic field on the magnetic properties of the materials was analyzed using a vibrating sample magnetometer (VSM) and the composition of the samples was analyzed using energy dispersive X‐ray spectrometry. These results indicate that the easy axis of magnetization in both the samples (normal‐to and in‐plane) is along the direction of the applied magnetic field.

Magnetic, morphological and structural investigations of CoFe/Si interfacial structures

“…Jie et al [9] studied the spin and orbital magnetic moment of Fe and Co in Co 0.9 Fe 0.1 film deposited on oxidised n-Si h100i substrate. Rajan et al [12] studied the effect of external magnetic field on growth of CoFe nanostructure on n-Si substrates. Tang et al [13] and Hamaya et al [14] have also studied electrical and magnetic properties of CoFe film on n-Si substrates.…”