2016
DOI: 10.1063/1.4947132
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Effect of annealing conditions on the perpendicular magnetic anisotropy of Ta/CoFeB/MgO multilayers

Abstract: Films with a structure of Ta (5 nm)/Co20Fe60B20 (0.8–1.5 nm)/MgO (1 nm)/Ta (1 nm) were deposited on Corning glass substrates by magnetron sputtering. The as-deposited films with CoFeB layer thickness from 0.8 to 1.3 nm show perpendicular magnetic anisotropy (PMA). After annealing at a proper temperature, the PMA of the films can be enhanced remarkably. A maximum effective anisotropy field of up to 9 kOe was obtained for 1.0- and 1.1-nm-thick CoFeB layers annealed at an optimum temperature of 300 °C. A 4-kOe ma… Show more

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Cited by 30 publications
(12 citation statements)
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“…3 (a), the thickness of MgO spacer within a range of 0.9 -1.25 nm had almost no influence on the fitting parameters, therefore, the values of fitting parameters 4πM ef f , g, α, and ∆H 0 are typical for all samples with various MgO thickness. Parameters determined from VNA-FMR spectra for the as-deposited in films with PMA is often strongly nonlinear due to either intermixing at interfaces [22] or magnetoelastic effects [15], with K ef f × t ef f exhibiting a maximum as a function of decreasing t ef f and with the PMA eventually being lost for small t ef f of, for example, 0.7 nm.…”
Section: Resultsmentioning
confidence: 99%
“…3 (a), the thickness of MgO spacer within a range of 0.9 -1.25 nm had almost no influence on the fitting parameters, therefore, the values of fitting parameters 4πM ef f , g, α, and ∆H 0 are typical for all samples with various MgO thickness. Parameters determined from VNA-FMR spectra for the as-deposited in films with PMA is often strongly nonlinear due to either intermixing at interfaces [22] or magnetoelastic effects [15], with K ef f × t ef f exhibiting a maximum as a function of decreasing t ef f and with the PMA eventually being lost for small t ef f of, for example, 0.7 nm.…”
Section: Resultsmentioning
confidence: 99%
“…This shows high potential to realize the two-domain structure in small size p-MTJs. Further, various strategies have also been reported to adjust these parameters experimentally, such as CoFeB thickness, [30,45] CoFeB composition, [46] annealing conditions, [45,46] Ta or W spacer thickness, [47] top MgO thickness, [30] inserted Mg layer between MgO and CoFeB, [48] voltage controlled magnetic anisotropy (VCMA), [43] and high order K eff . [35,44] In Figure 6d, we study the effect of the device geometry on the multi-level switching.…”
Section: Parameter Diagrams and Devices Optimizationmentioning
confidence: 99%
“…To investigate the effect of MgO film thickness at various temperatures on the magnetic anisotropy of MgO/CFA/ t MgO /Mo, we determine the K eff by using the relation Keff=MnormalS×HnormalK2 where M S and H K are the saturation magnetization of CFA layer (either in‐plane or perpendicular to the film) and uniaxial perpendicular anisotropy field, respectively. K eff mainly originates from the bulk and interface anisotropy and is usually described by the equation Keff=KnormalV2πMnormalS2+KnormalitCnormalo2FeAl …”
Section: Resultsmentioning
confidence: 99%
“…where M S and H K are the saturation magnetization of CFA layer (either in-plane or perpendicular to the film) and uniaxial perpendicular anisotropy field, respectively. K eff mainly originates from the bulk and interface anisotropy and is usually described by the equation [45,46]…”
Section: Resultsmentioning
confidence: 99%