Effect of annealing on CoSi2 thin films prepared by magnetron sputtering

Grain size estimations of annealed Ti–Ni shape memory thin films

“…(1), a plot of (β cos θ/λ) versus (sin θ/λ) is a straight line with a slope of 4e and an intercept of 1/D. In virtue of (1 1 0), (0 0 2) and (1 1 2) diffraction peaks from XRD profiles, the grain size and microstrains of B2 phase could be estimated [15,19]. Based on the above analysis, Fig.…”

“…An X-ray diffraction study based on precise measurements of the position, broadening and shape of XRD profiles gives information about the microstructural parameters like grain sizes, microstrains and dislocations in thin films or nanocrystalline materials [14][15][16][17][18]. Based on XRD data, there are normally two analysis methods for detailed evaluation of the crystal grain size and microstrain, Warren-Averbach and line integral breadth analysis [14,15,18].…”

“…Based on XRD data, there are normally two analysis methods for detailed evaluation of the crystal grain size and microstrain, Warren-Averbach and line integral breadth analysis [14,15,18]. The former require establishing the Fourier transform derived from the distribution function of diffraction intensity, which reflects the relation between grain sizes and microstrains [19]; the latter is in terms of the size-strain sep- aration by means of integral breadth of XRD profile [18].…”