“…magnetron reactive sputtered ZnO film (a thickness of 1000 nm) fabricated under the sputtering conditions of a working pressure of 1.33×10 -2 m bar, a r.f. power of 500 W, Ar-O 2 ratio 40: 60, and the substrate temperature of room temperature (RT) by Mehan et al revealed that the refractive indexes (n at λ = 550 nm) were 1.980 (n eb : extra ordinary refractive index ) and 1.963 (n ob : ordinary refractive index), as well as packing densities were 0.986 and 0.978 (extra ordinary refractive index of bulk ZnO, n eb = 2.006, and ordinary refractive index of bulk ZnO, n ob = 1.990), respectively (Mehan et al, 2004). Although lots of parameters can influence the quality of sputtered ZnO films, such high refractive index and packing density may be the extreme values for the sputterred ZnO films.…”