2013
DOI: 10.5757/jkvs.2013.22.6.321
|View full text |Cite
|
Sign up to set email alerts
|

Effect of Annealing Temperature on the Luminescence Properties of Digital-Alloy InGaAlAs Multiple Quantum Wells

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2017
2017
2020
2020

Publication Types

Select...
3

Relationship

1
2

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 9 publications
0
1
0
Order By: Relevance
“…[6,7]. Defects such as alloy disorder due to an intermixing of Ga and Al atoms at the interfaces between InGaAs well and InAlAs barrier can be created in the digital-alloy InGaAlAs grown with (In 0.53 Ga 0.47 As) 1-z / (In 0.52 Al 0.48 As) z short-period superlattices (SPSs) [8,9]. In order to reduce defects, which act as non-radiative recombination centers, many efforts such as rapid thermal annealing process and adjusting the thickness of InGaAs well and/or InAlAs barrier have been proposed [8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…[6,7]. Defects such as alloy disorder due to an intermixing of Ga and Al atoms at the interfaces between InGaAs well and InAlAs barrier can be created in the digital-alloy InGaAlAs grown with (In 0.53 Ga 0.47 As) 1-z / (In 0.52 Al 0.48 As) z short-period superlattices (SPSs) [8,9]. In order to reduce defects, which act as non-radiative recombination centers, many efforts such as rapid thermal annealing process and adjusting the thickness of InGaAs well and/or InAlAs barrier have been proposed [8][9][10].…”
Section: Introductionmentioning
confidence: 99%