Effect of annealing time on the structural, optical and electrical characteristics of DC sputtered ITO thin films

Şenol, Sevim Demirözü; Şenol, A.; Öztürk, O.; Erdem, Murat

doi:10.1007/s10854-014-2262-y

Cited by 20 publications

(6 citation statements)

References 32 publications

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“…The sheet (ρ S ) and volume (ρ V ) resistivities of the ITO heattreated films decreased with increasing r from 0.030 to 0.12 (Table 2), which could be caused by the increase in carrier density due to the replacement of In 3+ by Sn 4+ in bixbyite lattice. 16,26 The ITO film of r = 0.12 exhibited the lowest ρ S and ρ V of 2400 Ω sq −1 and 1.73 × 10 −2 Ω cm, respectively. The ρ S and ρ V values of the heat-treated films were 3 orders of magnitude higher than those of the ITO films prepared by vapor phase sputtering processes (ρ S : ca.…”

Section: Resultsmentioning

confidence: 97%

Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

2017

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We suggest a novel wet coating process for preparing indium tin oxide (ITO) films from simple solutions containing only metal salts and water via evaporation-driven film deposition during low-speed dip coating. Homogeneous ITO precursor films were deposited on silica glass substrates from the aqueous solutions containing In(NO)·3HO and SnCl·5HO by dip coating at substrate withdrawal speeds of 0.20-0.50 cm min and then crystallized by the heat treatment at 500-800 °C for 10-60 min under N gas flow of 0.5 L min. The ITO films heated at 600 °C for 30 min had a high optical transparency in the visible range and a good electrical conductivity. Multiple-coating ITO films obtained with five-times dip coating exhibited the lowest sheet (ρ) and volume (ρ) resistivities of 188 Ω sq and 4.23 × 10 Ω cm, respectively.

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Section: Resultsmentioning

confidence: 97%

Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

2017

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“…where D is crystal size, β is half-peak width, λ is wavelength of X-ray, and θ is Bragg angle. [28,29] TiO 2 thin films exhibit different crystal structures and growth orientations at different annealing temperatures.…”

Section: Resultsmentioning

confidence: 99%

“…The Debye–Scherrer equation is expressed by Equation ().

D = \frac{0.9 \lambda}{\beta \text{cos} \theta}

where D is crystal size, β is half‐peak width, λ is wavelength of X‐ray, and θ is Bragg angle. [ 28,29 ] TiO 2 thin films exhibit different crystal structures and growth orientations at different annealing temperatures.…”

Section: Resultsmentioning

confidence: 99%

Improving Solar Cell Efficiency through Controlled Annealing Effects of TiO₂ Thin Films

Kanmaz,

Tomakin

2024

Physica Status Solidi (a)

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In the scope of this research, the impact of thermal annealing on the electrical and optical characteristics of TiO2 thin films is investigated through empirical analysis. Varied annealing temperatures are applied during the production of TiO2 thin films, and their reflection, transmission, absorption, and crystalline structure attributes are meticulously gauged. Through systematic analysis, the optimal annealing temperature is determined to be 500 °C. Remarkably, TiO2 thin films fabricated under this specific temperature exhibit notably reduced reflection values. Moreover, comprehensive scrutiny extends to encompass both electrical and structural attributes, such as carrier density, resistivity, and crystal size, in addition to optical attributes. In the outcome, it is revealed that TiO2 thin films subjected to annealing at 500 °C exhibit the highest carrier density and the lowest resistivity. X‐ray diffraction analyses unveil the anatase phase of TiO2 thin films developed at this temperature. Notably, ascending annealing temperatures correlate with amplified crystal sizes and increased surface roughness. Furthermore, the TiO2 thin films are subsequently integrated into crystalline silicon solar cells via employment of the SCAPS (a Solar Cell Capacitance Simulator) software, culminating in a noteworthy 8% enhancement in solar cell efficiency.

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“…Heat treatment is effective in the modification of the structure, such as the structural defects, grain size, shape, and crystallinity, which plays an important role in the electrical properties of the ITO layers . The ITO‐b/PI film was subsequently annealed in vacuo at a temperature of 240°C to further improve the conductivity.…”

Section: Resultsmentioning

confidence: 99%

Transparent and conductive indium tin oxide/polyimide films prepared by high‐temperature radio‐frequency magnetron sputtering

Wen

Liu

Shen

et al. 2015

J of Applied Polymer Sci

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A highly transparent and thermally stable polyimide (PI) substrate was prepared and used for the fabrication of indium tin oxide (ITO)/PI films via radio-frequency magnetron sputtering at an elevated substrate temperature. The effect of the deposition conditions, that is, the oxygen flow rate, substrate temperature, sputtering power, and working pressure, on the optical and electrical properties of the ITO/PI films were investigated from the microstructural aspects. The results indicate that the optical and electrical properties of ITO were sensitive to the oxygen. Moreover, it was beneficial to the improvement of the ITO conductivity through the adoption of a high substrate temperature and sputtering power and a low working pressure in the deposition process. A two-step deposition method was developed in which a thick bulk ITO layer was overlapped by deposition on a thin seed ITO layer with a dense surface to prepare the highly transparent and conductive ITO/PI films. The ITO/PI film after annealing at 2408C gave a transmittance of 83% and a sheet resistance of 19.7 X/square.

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Effect of annealing time on the structural, optical and electrical characteristics of DC sputtered ITO thin films

Cited by 20 publications

References 32 publications

Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

Improving Solar Cell Efficiency through Controlled Annealing Effects of TiO₂ Thin Films

Transparent and conductive indium tin oxide/polyimide films prepared by high‐temperature radio‐frequency magnetron sputtering

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Effect of annealing time on the structural, optical and electrical characteristics of DC sputtered ITO thin films

Cited by 20 publications

References 32 publications

Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

Improving Solar Cell Efficiency through Controlled Annealing Effects of TiO2 Thin Films

Transparent and conductive indium tin oxide/polyimide films prepared by high‐temperature radio‐frequency magnetron sputtering

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Improving Solar Cell Efficiency through Controlled Annealing Effects of TiO₂ Thin Films