Evaporation-Driven Deposition of ITO Thin Films from Aqueous Solutions with Low-Speed Dip-Coating Technique

Abstract

We suggest a novel wet coating process for preparing indium tin oxide (ITO) films from simple solutions containing only metal salts and water via evaporation-driven film deposition during low-speed dip coating. Homogeneous ITO precursor films were deposited on silica glass substrates from the aqueous solutions containing In(NO)·3HO and SnCl·5HO by dip coating at substrate withdrawal speeds of 0.20-0.50 cm min and then crystallized by the heat treatment at 500-800 °C for 10-60 min under N gas flow of 0.5 L min. The ITO films heated at 600 °C for 30 min had a high optical transparency in the visible range and a good electrical conductivity. Multiple-coating ITO films obtained with five-times dip coating exhibited the lowest sheet (ρ) and volume (ρ) resistivities of 188 Ω sq and 4.23 × 10 Ω cm, respectively.

Printed Electronics Based on Inorganic Semiconductors: From Processes and Materials to Devices

“…The TFT arrays processed by self‐patterned amorphous IGZO semiconductor layer on top of the bar‐coated AlO x dielectric resulted in a field‐effect mobility of 6.0 cm 2 V −1 s −1 at an operating voltage of only 2 V. Next, Hong et al could demonstrate cost effective, large‐area coverage in the case of poly(acrylic acid)‐decorated multiwalled carbon nanotube TFTs with minimal ink requirement, however, with uncompromised device mobility values up to 7.34 cm 2 V −1 s −1 . In Table 1 , different solution‐processing techniques have been compared with respect to their characteristic features and required ink properties …”

Aqueous synthesis of tin- and indium-doped WO3 films via evaporation-driven deposition and their electrochromic properties

“…1). [29][30][31] The evaporation-induced concentration enabled us to make homogeneous WO 3 coating layers even from low-concentration solutions. Moreover, in this process, Sn-or In-doping was easily succeeded by the addition of tin or indium salts into the coating solutions.…”

“…We recently suggested a low-speed dip-coating technique as a novel coating technique for making metal oxide thin lms from organicadditive-free aqueous solutions. [29][30][31] Fig. 1 shows a schematic illustration of the lm deposition during low-speed dip coating.…”

Low-Temperature Solution-Processable Functional Oxide Materials for Printed Electronics

“…The best resistivity of ITO film deposited by sputtering was reported as low as 1.2 × 10 −4 Ω cm [70]. As an alternative to vacuum-based deposition, recently much efforts have been focused on production of solution-based deposition for high-performance ITO films using various approaches such as nanomaterials-based [71][72][73][74][75], aqueous metal salts solution [76], combustion synthesis [77,78], and advanced annealing techniques (microwave annealing [79] and ultraviolet laser annealing [80]. A summary of properties of ITO films prepared by various solution-based deposition processes is given in Table 3.…”