Effect of composition gradients in alloys on differential sputter parameters

Vicanek, M.; Sckerl, M.W.; Sigmund, Peter

doi:10.1016/s0168-583x(97)00998-1

Cited by 10 publications

(4 citation statements)

References 15 publications

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“…Formula (12) demonstrates that different components are generally not sputtered in proportion to their concentration on the surface of the material. In the literature, this phenomenon is called preferential sputtering [7].…”

Section: Sputter Process At Steady Statementioning

confidence: 99%

“…Then, substituting α j into equations (10)- (12) can give the energy and angular distributions of sputtered atoms and the partial sputtering yield at the steady state.…”

Section: Sputter Process At Steady Statementioning

confidence: 99%

“…Sigmund concluded that the isotopic puzzle is caused mainly by recoil implantation [11], but no analytical results were given to predict the isotope effect quantitatively. Later, Vicanek et al [12] ascribed the very large isotope enrichments to the effect of composition gradients near the target surface. However, Vicanek's theory could not predict the experimental results for the angular distribution of material ejected from targets bombarded at low ion energy [8,9].…”

Section: Introductionmentioning

confidence: 99%

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Modified Sigmund sputtering theory: isotopic puzzle

Zhang

2005

Radiation Effects and Defects in Solids

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The theory of anisotropic sputtering proposed by Zhang [Z.L. Zhang, Phys. Rev. B 71 026101 (2005).] and [Z.L. Zhang and L. Zhang, Radiat. Eff. Defects Solids 159(5) 301 (2004).] has been generalized to sputtering of isotopic mixtures. The present theory (modified Sigmund theory) has been shown to fit numerous simulations and experimental measurements, including energy and angular distribution of sputtered atoms. In particular, the theory has successfully solved the isotope puzzle of sputtering induced by low energy and heavy ion bombardment.

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Section: Sputter Process At Steady Statementioning

confidence: 99%

“…Then, substituting α j into equations (10)- (12) can give the energy and angular distributions of sputtered atoms and the partial sputtering yield at the steady state.…”

Section: Sputter Process At Steady Statementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Modified Sigmund sputtering theory: isotopic puzzle

Zhang

2005

Radiation Effects and Defects in Solids

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“…The sputtering phenomena have been widely studied by Sigmund since the 60s in the last century [36,[48][49][50][51]. A lot of his pioneering work in sputtering theory has since been frequently used as a reference standard in experimental research [52][53][54][55].…”

Section: The Bradley and Harper Model: Surface Erosion Velocity And Smentioning

confidence: 99%

A study of semiconductor nanostructures formed by surface modification

Wang¹

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Semiconductor nanostructures formed by a surface modification process caused by ion sputtering is studied in this thesis. The microscopic dynamics of the semiconductor surface undergoing ion impingement is discussed in detail. Due to the promising controllability and minimal damage creation on the substrate, low ion ABSTRACT iv suggests that the reported fabrication technique is significant for applications that aim to improve the radiative efficiency of GaAs/AlGaAs QDs by RTA without introducing large undesirable blueshift.

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