We have successfully developed a transmission-type GaAs/GaAsP strained superlattice (SL) photocathode, and a high spin-polarization (SP) (90%) with a super-high brightness (~10 7 A⋅cm −2 ⋅sr −1 ) of electron beam was achieved [1]. In this study, we report the design and fabrication of an optimized transmission-type photocathode with strain-compensated SL for higher quantum efficiency (QE).In the GaAs/GaAsP strained SL, a compressive strain was introduced in the GaAs well layers to obtain a large band-splitting between heavy-hole and light-hole mini-bands. The increasing SL pair-number causes strain relaxation with resultant SP degradation. A smaller SL layer thickness is one reason behind the limited value of the QE. To overcome this problem by increasing the SL layer thickness without degradation, the use of strain-compensated SL was proposed [2]. In this structure, a strain is introduced in the SL barrier layers to the opposite direction to compensate the strain in the SL well layers. Figure 1 shows the GaAs/GaAsP strain-compensated SL structure. The maximum pair of the prepared SL is 90.X-ray diffraction revealed that the strain relaxation by thickness increase was effectively controlled. Figure 2 shows the change of maximal spin-polarization with the SL pair number. The superlattice photocathodes up to 36-pair maintain high SP of about 90%. Then, the SP obviously decreased. During the transport, the spin-polarized electrons should flip by scattering with holes. The scattering effect becomes stronger in the thicker SL photocathodes. The thickness effect on the QE and transport time will be investigated.