2013
DOI: 10.1016/j.jcrysgro.2012.09.008
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Effect of compressive strain relaxation on surface morphology in GaAsP growth on GaP substrate

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Cited by 3 publications
(2 citation statements)
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“…Recently, it has been reported that compressive strain relaxation by the formation of an island structure in the early growth stage can effectively increase the flatness of the surface. 10) According to this strain relaxation model, the y value for a flat GaAs ð1ÀyÞ P y surface is in the range of 0-0.25. On the basis of results from the valence band splitting and strain relaxation models, the available y value is in the range 0.19-0.25.…”
mentioning
confidence: 99%
“…Recently, it has been reported that compressive strain relaxation by the formation of an island structure in the early growth stage can effectively increase the flatness of the surface. 10) According to this strain relaxation model, the y value for a flat GaAs ð1ÀyÞ P y surface is in the range of 0-0.25. On the basis of results from the valence band splitting and strain relaxation models, the available y value is in the range 0.19-0.25.…”
mentioning
confidence: 99%
“…GaP-based GaAs 1−y P y alloys have found applications in optoelectronic devices for a long time, and as a result the physical properties of these alloys such as atomic structure, energy band structure, and effective mass have been studied in great detail. However, the lack of suitable substrate leading to GaAs 1−y P y alloys to be grown on GaP substrates causes problems such as lattice mismatch [1], matching refractive index, and poor band structure configuration [2], which yield decreased layer thickness, poor carrier and optical confinement, and reduced electron effective mass [3]. With the incorporation of nitrogen (N) into GaAs 1−y P y alloy, these physical properties have been changed significantly and these major challenges are overcome [4].…”
Section: Introductionmentioning
confidence: 99%