2019
DOI: 10.1007/s00339-019-2436-9
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Effect of dynamic adjustment of diamond tools on nano-cutting behavior of single-crystal silicon

Abstract: A new method for adjusting the tool rake and flank angles by changing the position of the tools was used to dynamic explore the nano-cutting behavior of single-crystal silicon using MD simulation. Simulations under the same cutting conditions were carried out using a tool swinging to six different rake angles of − 10°, − 15°, − 20°, − 25°, − 30°, − 35°, and − 45°. The advantages of Tersoff potential function are discussed in comparison with those of using SW potential function. The coordination number, von Mis… Show more

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Cited by 7 publications
(2 citation statements)
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“…The discovery of a number of specific structures and phase transformations in silicon material [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] has attracted great attention in semiconductor industry in the recent decades. The physical properties of silicon materials are significantly affected by stress, which may lead to the evolution of phase transformation and the change of electric conductivity of the material.…”
Section: Introductionmentioning
confidence: 99%
“…The discovery of a number of specific structures and phase transformations in silicon material [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] has attracted great attention in semiconductor industry in the recent decades. The physical properties of silicon materials are significantly affected by stress, which may lead to the evolution of phase transformation and the change of electric conductivity of the material.…”
Section: Introductionmentioning
confidence: 99%
“…At present, there is a growing interest in understanding the mechanical properties of micro-and nanosized structures due to their wide applications in the development of micro-electromechanical systems (MEMS) and nanoelectromechanical systems (NEMS) [1][2][3][4][5][6]. These micro and nano components are capable of withstanding complex stress with little risk of failure.…”
Section: Introductionmentioning
confidence: 99%