Effect of energetic ion irradiation on CdI2 films

Abstract

The effect of plasma irradiation is studied systematically on a 4H polytype (002) oriented CdI2 stoichiometric film having compressive residual stress. Plasma irradiation was found to change the orientation to (110) of the film at certain moderate irradiation distances. A linear decrease in grain size and residual stress was observed with decreasing irradiation distance (or increasing ion energy) consistent with both structural and morphological observations. The direct optical energy gap Eg was found to increase linearly at the rate 15µeV/atm with the compressive stress. The combined data of present compressive stress and from earlier reported tensile stress show a consistent trend of Eg change with stress. The iodine-iodine distance in the unit cell could be responsible for the observed change in Eg with stress.

Role of Nitrogen Pressure on the Structural and Mechanical Properties of ZrON Composite Films Deposited by Plasma Focus Device

“…Such types of stress transformations have also been reported earlier[34,36]. The residual stresses and their transformation may be attributed to increase the mechanical properties like micro-hardness of the deposited P-ZrON composite films.…”

“…If the diffraction peak is shifted towards higher angle, the stress will be compressive while it is tensile if the diffraction peaks is shifted towards lower angle. The strains developed in Zr (101), ZrN (111) and Zr 3 N 4 (320) planes are estimated by employing the relation [57].…”

“…It is a source of neutrons, X-rays, highly energetic ions and relativistic electrons [29][30][31]. These energetic ions and relativistic electrons have been used to deposit different films of industrial applications [32][33][34][35][36][37][38][39][40][41][42][43].…”

Calculations of structural, elastic, electronic, and optical properties of trigonal CdI2

“…The trigonal CdI 2 crystal has six independent elastic constants that are presented in Table 2, together with previous data [27]. According to the mechanical stability criteria of the elastic constants in trigonal structure as [28][29][30][31]:…”

Deposition of Chromium Thin Films on Stainless Steel-304 Substrates Using a Low Energy Plasma Focus Device

“…It is a rich source of emitting the high energetic ions [14], X-rays [15], relativistic electrons [16,17] and neutrons [18]. The plasma focus device has many potential applications such as a soft X-ray source [19] for the next generation of microelectronics lithography, surface micromachining, pulsed X-ray and neutron source for medical and security inspection applications and material modification [20]. The energetic ions coming from the focus region in PF devices have been used for thermal surface treatment [21], phase change of thin films [22], thin film deposition [23,24] and ion implantation [25].…”