Effect of hafnium contaminant present in zirconium targets on sputter deposited ZrN thin films

Ramirez, D. A.; Brito, B.S.S.; Santos, Ivoneide; Soares, Vagner; Terto, A.R.; Oliveira, Givanilson Brito de; Hübler, Roberto; Batista, Wilton Walter; Tentardini, E.K.

doi:10.1016/j.nimb.2019.11.005

Cited by 23 publications

(15 citation statements)

References 18 publications

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“…Besides the peaks related to carbon (from the substrate) and zirconium, silicon and nitrogen originated from thin films, peaks related to oxygen and hafnium can be observed. Such contaminants were previously identified by our research group [16,17]. Oxygen atoms are originated from deposition chamber and hafnium is inherent to Zr target.…”

Section: Resultsmentioning

confidence: 97%

Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering

Dias

Terto

Neto

et al. 2022

Surface Engineering

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Zirconium silicon nitride thin films with 1.6% Si addition were deposited via reactive magnetron sputtering and characterized by RBS, SEM-FEG, GAXRD, XPS and high temperature oxidation tests, aiming to investigate how silicon is structurally inserted in Zirconium nitride (ZrN) matrix. GAXRD results show a reduction in lattice parameter and grain size due to Si incorporation and XPS analyses demonstrate Si is present only in nitride form. Such observations proved the non-formation of substitutional or interstitial solid solution in ZrN, but the presence of Si 3 N 4 , even in low Si concentrations.

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Section: Resultsmentioning

confidence: 97%

Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering

Dias

Terto

Neto

et al. 2022

Surface Engineering

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“…Researchers may be inadvertently adding Hf or other defects into their films even when they think they may have an ultrahigh‐pure precursor material, complicating optical properties with less expensive but chemically dubious targets. This presents an interesting tradeoff: the incorporation of small quantities of Hf atoms may increase microhardness in ZrN films [ 30 ] (additionally a more economical alternative compared with the use of highly pure Zr precursors), which is relevant to industrial applications in hard, durable, and decorative coatings for extreme environments, but this may also lead to a larger imaginary part of permittivity arising from incorporation of the inherently more lossy HfN in the ZrN host material and a decrease in the damage threshold of a ZrN film, limiting its value in extreme environments.…”

Section: Discussionmentioning

confidence: 99%

“…The role of Hf impurities in sputtered ZrN films has been explored to some extent regarding its hardness and oxidation resistance at high temperature, [ 30 ] but the effects of these Hf defects on permittivity of the Hf x :Zr y N z system are unreported and of large value to reducing the barrier to entry of studies relying on the optical properties of sputtered ZrN and attainment of low‐loss plasmonic materials. To explore the effects on permittivity of this nontrivial Hf concentration and determine whether impurities play a significant role in ZrN optical properties, our approach is to measure the structural, chemical, and optical properties of ZrN films grown on Si and c‐sapphire substrates with reactive RF magnetron sputtering from a Kurt Lesker‐grade 702 Zr target (having Hf impurities) over a broad Zr and N stoichiometry range.…”

Section: Introductionmentioning

confidence: 99%

Influence of Hafnium Defects on the Optical and Structural Properties of Zirconium Nitride

Bopp

Qian

Liu

2021

Physica Rapid Research Ltrs

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Recently, the application of transition metal mononitrides (TMNs) to plasmonics and nonlinear optics has grown at an astounding rate. TiN and ZrN have emerged as the dominating materials in this direction. However, even though ZrN is reported to have lower dielectric losses and enhanced tunability in plasmonic applications when compared with TiN, the body of work regarding TiN is much more mature than that of ZrN. This imbalance of work regarding ZrN may be in part an effect of pollution in precursor materials for the fabrication of ZrN, leading to an increased imaginary part of permittivity and frustration in reproduction of ZrN with literature‐like properties. Herein, the effects of Hf defects (a common pollutant in Zr) on the optical properties of nitride films grown with radio frequency (RF) magnetron sputtering are reported. Hf defects are introduced into nitride films with a sputtering target made of the Hf‐polluted “grade 702” Zr alloy. Hf defects are found in all analyzed films with concentrations at around ≈0.5−1 at %. Chemical, structural, and optical properties of RF magnetron‐sputtered Hf x :Zr y N z films (x ≪ y,z) are characterized and discussed.

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“…The introduction of up to 11.9 at.% Hf in the ZrN coating did not affect the level of residual stresses [29]. According to [30], when the content of Hf increases from 0.9 to 3.7 at.%, the hardness of the coating and its oxidation resistance increases at 500 • C, while with a further increase in the content of Hf to 5.5 at.%, the hardness and oxidation resistance decrease. At 600 • C, the coatings are actively oxidized, and the content of Hf does not have any noticeable effect on the process of active oxidation [30].…”

Section: Introductionmentioning

confidence: 96%

Investigation of Properties of the Zr,Hf-(Zr,Hf)N-(Zr,Hf,Me,Al)N Coatings, Where Me Means Cr, Ti, or Mo

Vereschaka¹,

Sitnikov²,

Волосова

et al. 2021

Coatings

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The article describes the results of the investigation focused on the properties of the Zr,Hf-(Zr,Hf)N-(Zr,Hf,Me,Al)N coatings, where Me means chromium (Cr), titanium (Ti), or molybdenum (Mo). These coatings have three-layer architecture, including adhesion, transition, and wear-resistant layers, while the latter, in turn, has a nanolayer structure. Despite the fact that the coatings under study have close values of hardness and critical fracture load LC2, there are noticeable differences in wear resistance during the turning of steel. The tools with the coatings under study demonstrated better wear resistance compared to an uncoated tool and the tool with the commercial ZrN coating. The best wear resistance was detected for a tool with the Zr,Hf-(Zr,Hf)N-(Zr,Hf,Ti,Al)N coating. The study of the pattern of cracking in the structure of the coatings has found that, during the cutting process, active cracking occurs in the coating with Cr, which leads to the fracture of the coating, while the process of cracking is noticeably less active in the coatings with Ti or Mo.

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Effect of hafnium contaminant present in zirconium targets on sputter deposited ZrN thin films

Cited by 23 publications

References 18 publications

Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering

Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering

Influence of Hafnium Defects on the Optical and Structural Properties of Zirconium Nitride

Investigation of Properties of the Zr,Hf-(Zr,Hf)N-(Zr,Hf,Me,Al)N Coatings, Where Me Means Cr, Ti, or Mo

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Effect of hafnium contaminant present in zirconium targets on sputter deposited ZrN thin films

Cited by 23 publications

References 18 publications

Structural investigation of ZrN+Si3N4 thin films co-deposited by magnetron sputtering

Structural investigation of ZrN+Si3N4 thin films co-deposited by magnetron sputtering

Influence of Hafnium Defects on the Optical and Structural Properties of Zirconium Nitride

Investigation of Properties of the Zr,Hf-(Zr,Hf)N-(Zr,Hf,Me,Al)N Coatings, Where Me Means Cr, Ti, or Mo

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Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering

Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering