Effect of heat treatment on the oxygen content and resistivity in sputtered NiO films

Kohmoto, O.; Nakagawa, Hiromichi; Isagawa, Y.; Chayahara, Akiyoshi

doi:10.1016/s0304-8853(00)01043-x

Cited by 36 publications

(20 citation statements)

References 2 publications

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“…Resistivity of pure stoichiometric nickel oxide is known as high as 10 13 Ω cm at room temperature [9]. However, as-deposited films are usually non-stoichiometric NiO structure.…”

Section: Resultsmentioning

confidence: 99%

“…However, as-deposited films are usually non-stoichiometric NiO structure. And the electric resistivity of deposited nickel oxides reduced drastically are less than tens of Ω cm including non-stoichiometric nickel oxides which have three orders smaller magnitude than that of bulk NiO ( 10 4 Ω cm) [10]. Increased RF power seems to drive stronger forces to migrate each atom into more suitable lattice sites resulting in more stable and perfect crystals.…”

Section: Resultsmentioning

confidence: 99%

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NiO Films Formed at Room Temperature for Microbolometer

Jung¹,

Koo²,

Lee³

et al. 2013

Journal of Sensor Science and Technology

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Nickel oxide films using RF sputter was formed on the SiO 2 /Si substrate at the room temperature controlled with water circulation system. The feasibility of nickel oxide film as a bolometric material was demonstrated. GIXRD spectrum on NiO(111), NiO(200), and NiO(220) orientation expected as the main peaks were appeared in the grown nickel oxide films. The typical resistivity acquired at the RF power of 100W was about 34.25 Ω cm. And it was reduced to 18.65 Ω cm according to the increase of the RF power to 400W. The TCR of fabricated micro-bolometer with the resistivity of 34.25 Ω cm was -2.01 %/ o C. The characteristics of fabricated nickel oxide film and micro-bolometer were analyzed with XRD pattern, resistivity, TCR, and SEM images. Received : Aug. 1, 2013, Revised : Sep. 24, Accepted : Sep. 25, 2013 This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License(http://creativecommons.org/licenses/bync/3.0)which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited. Keywords

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“…Resistivity of pure stoichiometric nickel oxide is known as high as 10 13 Ω cm at room temperature [9]. However, as-deposited films are usually non-stoichiometric NiO structure.…”

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

NiO Films Formed at Room Temperature for Microbolometer

Jung¹,

Koo²,

Lee³

et al. 2013

Journal of Sensor Science and Technology

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“…it contracts (Table 1). Such behaviour is not possible in the perfect cubic lattice, however in real nanoparticles/nanocrystallites the effect is caused by the Ni-O bond shortening at the surface and around nickel vacancies [19,35,36], which are present in our dark brown thin films [9][10][11]. In the next section we will demonstrate how the average size of nanoparticles/nanocrystallites and the concentration of nickel vacancies can be simultaneously estimated by taking into account multiple-scattering effects in the EXAFS analysis.…”

Section: Extended X-ray Absorption Fine Structure (Exafs)mentioning

confidence: 93%

“…The film deposition was performed at three Ar/O 2 ratios equal to 0/100 (TF1), 50/50 (TF2) and 90/10 (TF3). Thus obtained thin films had thicknesses of about 1 m and dark brown colour, suggesting the presence of nickel vacancies [9][10][11]. Commercial microcrystalline NiO powder (c-NiO, Aldrich, 99%), having green colour, was used for comparison.…”

Section: Methodsmentioning

confidence: 99%

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Local structure relaxation in nanocrystalline Ni1−xO thin films

et al. 2014

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Non-stoichiometric nickel oxide (Ni 1-x O) thin films were prepared by DC magnetron sputtering technique in mixed Ar/O 2 atmosphere and studied by synchrotron radiation Ni K-edge x-ray absorption spectroscopy, x-ray diffraction and scanning electron microscopy. The use of advanced modelling technique, combining classical molecular dynamics with ab initio multiplescattering extended X-ray absorption fine structure (EXAFS) calculations, allowed us to describe the structure relaxation and dynamics in nanocrystallites and to estimate their size and the concentration of nickel vacancies. Highlights Nickel oxide thin films were prepared by DC magnetron sputtering. Local structure of Ni 1-x O thin films was studied by x-ray absorption spectroscopy. The atomic structure of Ni 1-x O thin films is strongly relaxed. Ni vacancies in Ni 1-x O thin films play important role in atomic structure relaxation.

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Calcined Nickel Oxide Nanostructures at Different Temperatures Onto Graphite for Efficient Electro‐Oxidation of Ethylene Glycol in Basic Electrolyte

Zouli,

Hameed,

Abutaleb

et al. 2024

Applied Organom Chemis

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Fabricating a highly active and stable nanocatalyst material displays a great concern when constructing a commercially viable ethylene glycol (EG) fuel cell. Herein, nickel oxide nanostructures were grown onto graphite (NO/T) using coprecipitation and calcination protocol at different temperatures. Techniques for XRD, TEM, SEM, and EDX investigations were used to look into the produced crystal planes, shape, and elemental mapping of synthesized nickel oxide nanoparticles. Different NO/T nanocatalyst electroactivities were examined in order to oxidize EG molecules in basic electrolyte. The surface area values of calcined nanostructures at 200°C and 300°C were much higher than those measured at NO/T‐400 by 7.62 and 3.71 folds to explain their outstanding performance. Some kinetic information for varied NO/T nanocatalysts was derived including the electron transfer coefficient, rate constant, and surface coverage values. Electron transfer rate constants of 0.1946, 0.3734, 0.0113, and 0.0303 s−1 were calculated at NO/T‐200, NO/T‐300, NO/T‐400, and NO/T‐500, respectively. Increased oxidation current densities could be achieved when NO/T nanomaterials were subjected to lowered calcination temperatures. NO/T‐200 and NO/T‐300 nanocatalysts also displayed decreased Eonset for alcohol oxidation process by 20 and 41 mV in relation to that at NO/T‐400. Moreover, chronoamperometric experiments revealed the prevalence of the stable behavior during EG oxidation at these nanostructures, especially for calcined ones at 200°C and 300°C. Much reduced poisoning rates were measured at NO/T‐200 (0.171 s−1) and NO/T‐300 (0.067 s−1) when contrasted to that at NO/T‐500 (0.727 s−1). Increasing the alcohol and supporting electrolyte concentrations was beneficial in improving the charge transfer characteristics of NO/T nanocatalysts as demonstrated by EIS measurements. This study supports the promising activity of NiO nanoparticles onto graphite as anode materials for direct alcohol fuel cells.

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Effect of heat treatment on the oxygen content and resistivity in sputtered NiO films

Cited by 36 publications

References 2 publications

NiO Films Formed at Room Temperature for Microbolometer

NiO Films Formed at Room Temperature for Microbolometer

Local structure relaxation in nanocrystalline Ni1−xO thin films

Calcined Nickel Oxide Nanostructures at Different Temperatures Onto Graphite for Efficient Electro‐Oxidation of Ethylene Glycol in Basic Electrolyte

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