As a well-developed industrial fabricating method, magnetron sputtering technique has its distinct advantages for the large-scale production. In order to investigate the effect of buffer layer on the formation and thermochromic performances of VO 2 films, using RF magnetron sputtering method, we fabricated three kinds of buffer layers SiO 2 , TiO 2 and SnO 2 on soda lime float-glass. Then according to the reactive DC magnetron sputtering method, VO 2 films were deposited. Due to the restriction of heat treatment temperature when using soda lime float-glass as substrates, dense rutile phase TiO 2 can not be formed, leading to the formation of vanadium oxide compounds containing Na ions. When using SnO 2 as buffer layer, we found that relatively high pure VO 2 can be deposited more easily. In addition, compared with the effect of SiO 2 buffer layer, we observed an enhanced visible transparency, a decreased infrared emissivity, which should be mainly originated from the modified morphology and/ or the hetero-structured VO 2 / SnO 2 interface.