Effect of radical fluorination on mono- and bi-layer graphene in Ar/F2 plasma

Tahara, Kosuke; Iwasaki, Takayuki; Matsutani, Akihiro; Hatano, Mutsuko

doi:10.1063/1.4760268

Cited by 48 publications

(36 citation statements)

References 20 publications

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“…1(b)). This is the maximum ratio observed so far in the literature 16,17 (same for plasma fluorination 5,6 ), and longer plasma treatment does not result in any further changes in the Raman spectrum. 9,10 Some regions in Fig.…”

supporting

confidence: 52%

“…3,4 An alternative method is "plasma fluorination" which results in "fluoroninated graphene" with 1 fluorine atom per 6 carbon atoms at saturation. 5,6 A similar system is "hydrogenated graphene" that has a different charge carrier mobility and lattice parameter than that of pristine graphene. 7 However, there is still no method which results in full hydrogenation of graphene, i.e., graphane formation.…”

mentioning

confidence: 99%

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Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering

Eren

Marot

et al. 2015

Applied Physics Letters

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In this work, the optical response of graphene to hydrogen plasma treatment is investigated with spectroscopic ellipsometry measurements. Although the electronic transport properties and Raman spectrum of graphene change after plasma hydrogenation, ellipsometric parameters of the Si/SiO2/graphene tri-layer system do not change. This is attributed to plasma hydrogenated graphene still being electrically conductive, since the light absorption of conducting 2D materials does not depend on the electronic band structure. A change in the light transmission can only be observed when higher energy hydrogen ions (30 eV) are employed, which chemically sputter the graphene layer. An optical contrast is still apparent after sputtering due to the remaining traces of graphene and hydrocarbons on the surface. In brief, plasma treatment does not change the light transmission of graphene; and when it does, this is actually due to plasma damage rather than plasma hydrogenation.

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supporting

confidence: 52%

mentioning

confidence: 99%

Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering

Eren

Marot

et al. 2015

Applied Physics Letters

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“…The creation of active sites is exploited to enhance its sensitivity and sensibility to specific molecules. Post synthesis plasma‐based technique is reported to be a clean and effective tool to incorporate foreign atoms in the hexagonal carbon lattice . For an optimal integration in actual devices, is needed to locally unravel the chemical bonding environment in functionalized graphene and to control the functionalization homogeneity at the individual graphene flake level.…”

Section: Resultsmentioning

confidence: 99%

“…Post synthesis plasmabased technique is reported to be a clean and effective tool to incorporate foreign atoms in the hexagonal carbon lattice. [16,17] For an optimal integration in actual devices, is needed to locally unravel the chemical bonding environment in functionalized graphene and to control the functionalization homogeneity at the individual graphene flake level. In this regard, the technical capabilities of the SPEM are exploited and here we report on the fluorination and nitridation of both suspended and supported graphene by means of a commercial m-wave plasma source (Tectra) fed with SF 6 and N 2 gas, respectively.…”

Section: Spectromicroscopy Investigation Of Functionalized Graphenementioning

confidence: 99%

Scanning Photoelectron Spectro‐Microscopy: A Modern Tool for the Study of Materials at the Nanoscale

Zeller

Amati

Sezen

et al. 2018

Physica Status Solidi (a)

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The advanced properties of modern materials originate from their nanoscale size and shape and from chemical modifications or doping. Special techniques that can measure the chemical state in the nanoscale are required for exploration and understanding the properties of these materials. While X‐ray photoelectron spectroscopy (XPS) can access the necessary chemical information, conventional setups have no spatial resolution. The scanning photoelectron microscope (SPEM) takes in advent the third generation synchrotron radiation facilities and uses a zone plate (ZP) focusing optics that allows spatially resolved XPS measurements in the submicron scale. Several recent examples of investigations of chemically modified or doped nanomaterials are given. The modification of suspended and supported graphene with nitrogen and fluorine is presented as well as the doping dependent position of the Fermi‐level in single GsAs nanowires and the Mott–Hubbard transition in Cr‐doped vanadium oxide. These examples show several peculiar SPEM abilities like a high surface and chemical sensitivity and a submicron spatial resolution proving the capability and importance of this technique to study materials at the nanoscale.

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“…Our approach includes the possibility of Janus‐type patterned functionalization, which has not been realized to date, although unpatterned Janus graphene has been accomplished in a step‐by‐step procedure or simultaneously by trapping the starting graphene at the liquid–liquid interface . Remarkably, the mild fluorination approach shown here is reasonably facile, whereas the methods reported to date generally involve hazardous gases (F 2 or XeF 2 ), or expensive plasma or laser equipment …”

Section: Methodsmentioning

confidence: 99%

Spatially Resolved Bottom‐Side Fluorination of Graphene by Two‐Dimensional Substrate Patterning

et al. 2020

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Patterned functionalization can, on the one hand, open the band gap of graphene and, on the other hand, program demanding designs on graphene. The functionalization technique is essential for graphene‐based nanoarchitectures. A new and highly efficient method was applied to obtain patterned functionalization on graphene by mild fluorination with spatially arranged AgF arrays on the structured substrate. Scanning Raman spectroscopy (SRS) and scanning electron microscopy coupled with energy‐dispersive X‐ray spectroscopy (SEM‐EDS) were used to characterize the functionalized materials. For the first time, chemical patterning on the bottom side of graphene was realized. The chemical nature of the patterned functionalization was determined to be the ditopic scenario with fluorine atoms occupying the bottom side and moieties, such as oxygen‐containing groups or hydrogen atoms, binding on the top side, which provides information about the mechanism of the fluorination process. Our strategy can be conceptually extended to pattern other functionalities by using other reactants. Bottom‐side patterned functionalization enables utilization of the top side of a material, thereby opening up the possibilities for applications in graphene‐based devices.

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Effect of radical fluorination on mono- and bi-layer graphene in Ar/F2 plasma

Cited by 48 publications

References 20 publications

Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering

Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering

Scanning Photoelectron Spectro‐Microscopy: A Modern Tool for the Study of Materials at the Nanoscale

Spatially Resolved Bottom‐Side Fluorination of Graphene by Two‐Dimensional Substrate Patterning

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