Effect of the laser radiation intensity on the kinetics of the heterogeneous photochemical reaction between single-crystal germanium and bromine gas

Бетеров, И. И.; Chebotaev, V. P.; Yurshina, N I; Yurshin, B. Ya.

doi:10.1070/qe1978v008n11abeh011254

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Cited by 27 publications

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“…This is being investigated for microelectronic device fabrication in processes such as chemical etching, chemical vapour deposition, semiconductor doping and metal alloying. Laser enhanced chemical etching studies have been carried out primarily at the infrared (IR) and visible lines with pulsed TEA CO 2 and CW Ar + lasers [1][2][3][4][5][6][7][8]. On the other hand, progress is being made in UV photochemistry with excimer lasers [9][10][11].…”

Section: Introductionmentioning

confidence: 99%

SF₆decomposition and layer formation due to excimer laser photoablation of SiO₂surface at gas–solid system

Sajad¹,

Parvin²,

Bassam³

2004

J. Phys. D: Appl. Phys.

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In this work, the effect of an excimer laser has been studied for presenting a method for SF6 decomposition and simultaneous formation of a SiF2 layer on amorphous SiO2. Though the excimer laser did not establish a gas phase photodissociation, we have shown that UV photoablation leads strongly to molecular decomposition in the SF6–SiO2 system. Moreover, the dependence of the decomposition process on the exposure parameters such as the wavelength and intensity as well as the gas pressure and the focal point distance from the gas–solid interface has been investigated.

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Section: Introductionmentioning

confidence: 99%

SF₆decomposition and layer formation due to excimer laser photoablation of SiO₂surface at gas–solid system

Sajad¹,

Parvin²,

Bassam³

2004

J. Phys. D: Appl. Phys.

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Materials Processing

Duley¹

1983

Laser Processing and Analysis of Materials

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Laser-Assisted Chemical Etching of Inorganic Materials: Mechanistic Studies

Chuang¹,

Hussla²,

Sesselmann³

1984

Springer Series in Chemical Physics

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Effect of the laser radiation intensity on the kinetics of the heterogeneous photochemical reaction between single-crystal germanium and bromine gas

Cited by 27 publications

References 0 publications

SF₆decomposition and layer formation due to excimer laser photoablation of SiO₂surface at gas–solid system

SF₆decomposition and layer formation due to excimer laser photoablation of SiO₂surface at gas–solid system

Materials Processing

Laser-Assisted Chemical Etching of Inorganic Materials: Mechanistic Studies

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Effect of the laser radiation intensity on the kinetics of the heterogeneous photochemical reaction between single-crystal germanium and bromine gas

Cited by 27 publications

References 0 publications

SF6decomposition and layer formation due to excimer laser photoablation of SiO2surface at gas–solid system

SF6decomposition and layer formation due to excimer laser photoablation of SiO2surface at gas–solid system

Materials Processing

Laser-Assisted Chemical Etching of Inorganic Materials: Mechanistic Studies

Contact Info

Product

Resources

About

SF₆decomposition and layer formation due to excimer laser photoablation of SiO₂surface at gas–solid system

SF₆decomposition and layer formation due to excimer laser photoablation of SiO₂surface at gas–solid system