A combination of in situ X-ray photoelectron spectroscopy
and mass spectrometry has been used to elucidate the elementary surface
reactions initiated by the interaction of low-energy (860 eV) argon
ions with three organometallic precursors [Ru(CO)4I2, Co(CO)3NO, and WN(NMe2)3]. The effects of ion exposure on each precursor can be described
by a largely sequential series of surface reactions. The initial step
involves ion-induced decomposition of the precursor to create a nonvolatile
deposit, followed by physical sputtering of the atoms in the deposit.
For the precursors that contain CO ligands [Ru(CO)4I2 and Co(CO)3NO], ion-induced decomposition is accompanied
by desorption of the majority of the CO groups. This is in marked
contrast to previous studies of low-energy electron-induced reactions
with the same precursors where precursor decomposition yielded only
partial desorption of the CO ligands. Conversely, argon ion bombardment
of WN(NMe2)3 led to decomposition without ligand
loss. For all three precursors, the initial ion-induced decomposition
step was not accompanied by significant desorption of intact precursor
molecules, while during subsequent physical sputtering of the deposited
atoms, ligand-derived organic and inorganic contaminants were removed
at higher rates than the metals. This indicates that controlled ion
beam deposition conditions could be used to produce deposits with
high metal contents from all three precursors. Comparison of low-energy
electron-induced reactions of these three precursors with results
of this investigation indicates that secondary electrons do not play
an important role in the deposition process, but rather precursor
decomposition occurs via efficient ion–molecule energy transfer.
These reactions are discussed in the context of focused ion beam-induced
deposition.