This study investigates the effects of 30 keV proton
ion irradiation
on the structural, morphological, and linear–nonlinear optoelectronic
properties of Sb40Se20S40 thin films.
The retention of an amorphous nature and vibrational bonding rearrangements
caused by ion irradiation demonstrate structural tailoring. The cumulative
decrease in roughness with an increase in ion dose decreases the surface
energy and optical absorption loss. With the blue shifting of the
absorption edges, proton irradiation increased the optical transmittance
and reflectance. The variation of fluence changes the optical bandgap
and Urbach energy, which are induced by local structural changes caused
by defects and disorder. The refractive index decreased considerably,
which supports the Moss rule. Proton irradiation reduced the interband
transition and average band energy gap of the system. However, ion
irradiation increased optical losses while decreasing optical conductivity
and dielectric characteristics. The third-order nonlinear susceptibility
and nonlinear refractive index decreased significantly as the fluence
increased. Such materials with optical tuning capabilities via ion
fluence are essential for cutting-edge photonic and optoelectronic
applications.