Effect of TMCTS silylation treatments on crosslinking density of low-k zeolite porous silica film

Abstract

Silylation treatment processes on pore surfaces in a pure silica zeolite (PSZ) porous low dielectric constant (low-k) film were investigated for high elastic modulus. As the silylation process, 1,3,5,7-tetramethylcyclotetrasiloxane (TMCTS) treatment and ultra-violet (UV, λ = 172 nm) treatments on low-k films were investigated. The PSZ precursor was synthesized using by a two-step method. The TMCTS and UV treatments were executed several times. After three repeated processes with the TMCTS and UV treatments, the elastic modulus and relative permittivity became 11.3 GPa, and 2.4. The elastic modulus and relative permittivity were increased with 2.7 GPa and 0.08, compared to the two repeated process with TMCTS and UV treatments. Mechanism of the elastic modulus’ increase is also discussed.