ISLPED '05. Proceedings of the 2005 International Symposium on Low Power Electronics and Design, 2005. 2005
DOI: 10.1109/lpe.2005.195478
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Effectiveness of low power dual-V/sub t/ designs in nano-scale technologies under process parameter variations

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Cited by 4 publications
(5 citation statements)
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“…The relationship between RDF and the threshold voltage is shown in Fig .3. A very important observation is that, for a given technology RDF is increasing dramatically as threshold voltage increases and especially in smaller technologies (for 9nm, more than 50% increase in σRDF between =50 and 200mV) as in [1]. Thus, if σRDF needs to be reduced, the threshold voltage has to be reduced as well.…”
Section: Proposed Techniquementioning
confidence: 99%
“…The relationship between RDF and the threshold voltage is shown in Fig .3. A very important observation is that, for a given technology RDF is increasing dramatically as threshold voltage increases and especially in smaller technologies (for 9nm, more than 50% increase in σRDF between =50 and 200mV) as in [1]. Thus, if σRDF needs to be reduced, the threshold voltage has to be reduced as well.…”
Section: Proposed Techniquementioning
confidence: 99%
“…To the best of our knowledge, the last paper, [21], was the only paper to address the impact of process variation considering multi-Vt designs. In this paper, we address this issue from a different angle to show how multi-Vt design can be used to reduce the impact of variation and, at the same time, to reduce static power consumption.…”
Section: Previous Workmentioning
confidence: 99%
“…This problem is referred to as threshold voltage variation due to random dopant fluctuation (RDF), and it is considered a major problem in current technologies and expected to be worse in future technologies [18,21,22]. Since in smaller technologies, the total number of dopants is expected to be lower; thus, the problem is likely to be worse [11,20].…”
Section: Motivationmentioning
confidence: 99%
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“…6 In transistors with channel lengths below 50 nm, band-to-band tunneling (BTBT) can dominate I off , negating the effect of using relatively higher threshold voltages. 7 A review of several low leakage techniques and how they affect the total energy of a CMOS gate is conducted in Section 2, then Section 3 presents pass transistor logic (PTL) as a good alternative to low leakage logic design. Section 4 introduces the sense amplifier-based pass transistor logic (SAPTL) topology as a low leakage circuit alternative that allows continued energy reduction through voltage scaling even in the presence of leakage and discusses the organization and synchronous timing operation of the SAPTL.…”
Section: Introductionmentioning
confidence: 99%