2002
DOI: 10.1063/1.1481235
|View full text |Cite
|
Sign up to set email alerts
|

Effects of cathode materials and arc current on optimal bias of a cathodic arc through a magnetic duct

Abstract: A negatively biased collecting plate was used to collect the ion current of the cathodic arc plasma transported through a curved magnetic duct. The optimal duct bias at which the duct has the maximum efficiency for plasma transport was measured for C, Ti, Mo, and W plasmas as a function of the arc current and guiding magnetic field. The optimal bias decreased with the magnetic field and was almost steady when the field was above 400 G. The optimal bias at 400 G and above increased with the arc current for C pl… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
9
0

Year Published

2004
2004
2010
2010

Publication Types

Select...
5
1
1

Relationship

3
4

Authors

Journals

citations
Cited by 17 publications
(9 citation statements)
references
References 14 publications
0
9
0
Order By: Relevance
“…This is thought to be in part due to the effective elimination of Zr macro-particles formed in the cathodic arc by the curved magnetic filter. The process efficacy can be evaluated according to the simulation results of the zirconium contents in the layer [18]. Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…This is thought to be in part due to the effective elimination of Zr macro-particles formed in the cathodic arc by the curved magnetic filter. The process efficacy can be evaluated according to the simulation results of the zirconium contents in the layer [18]. Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The ZrO 2 thin films were fabricated on n-type, 100 mm Si (1 0 0) wafers using a filtered cathodic arc system [18]. The experimental apparatus used in this study included a magnetic duct and cathodic arc plasma source.…”
Section: Methodsmentioning
confidence: 99%
“…ZrO 2 thin films were deposited on n-type, 100 mm Si (1 0 0) wafers using a filtered cathodic arc system. The experimental apparatus consisted of a magnetic duct and cathodic arc plasma source [21]. A 99.9% pure Zr rod with a diameter of 1 cm served as the cathode and oxygen was bled into the arcing region.…”
Section: Methodsmentioning
confidence: 99%
“…They are not affected by the magnetic field and thus strike the wall of the curved duct instead of being transmitted through the curved filter. 22,23 Hence, the deposited films would be free of Al marcoparticles. The schematic of the hardware is depicted in Fig.…”
Section: Experimental Apparatusmentioning
confidence: 99%