Effects of magnetic field strength and deposition pressure on the properties of TiN films produced by high power pulsed magnetron sputtering (HPPMS)

Wu, Jian; Wu, Baohua; Ma, D.L.; Xie, Di; Wu, Yanping; Chen, C.Z; Li, Y.T.; Sun, Hong; Huang, Nan; Leng, Y.X.

doi:10.1016/j.surfcoat.2017.02.051

Cited by 34 publications

(12 citation statements)

References 42 publications

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“…From the description above, one can note that both the ionization fraction and ion flux fraction have a big divergence, from below 10% to over 90%, even for the same metal target. The inconsistent values are related to the magnetic configuration [24,25,43,44], applied power density, and target materials, as well as the power supply. Of course the diagnostic methodology is also very important, and the divergence of the degree of ionization in different methods is quite large.…”

Section: Ionization Fraction and Ion Flux Fractionmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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High power impulse magnetron sputtering (HiPIMS) has attracted a great deal of attention because the sputtered material is highly ionized during the coating process, which has been demonstrated to be advantageous for better quality coating. Therefore, the mechanism of the HiPIMS technique has recently been investigated. In this paper, the current knowledge of HiPIMS is described. We focus on the mechanical properties of the deposited thin film in the latest applications, including hard coatings, adhesion enhancement, tribological performance, and corrosion protection layers. A description of the electrical, optical, photocatalytic, and functional coating applications are presented. The prospects for HiPIMS are also discussed in this work.

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Section: Ionization Fraction and Ion Flux Fractionmentioning

confidence: 99%

High power impulse magnetron sputtering and its applications

Yang

Liu

Chen

2018

Plasma Sci. Technol.

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“…The Young’s modulus exhibits a similar tendency. The enhanced hardness was attributed to both a dense microstructure without inter-columnar voids that were prepared during film growth in HPPMS discharge [ 24 ] and the fact that (111) is the hardest orientation in TiN [ 25 ].…”

Section: Resultsmentioning

confidence: 99%

TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature

et al. 2018

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Depleted uranium (DU) is oxidized readily due to its chemical activities, which limits its applications in nuclear industry. TiN film has been applied widely due to its good mechanical properties and its excellent corrosion resistance. In this work, TiN protection films were deposited on DU by direct current magnetron sputtering (DCMS) and high power pulsed magnetron sputtering (HPPMS), respectively. The surface morphology and microstructures were investigated by atomic force microscope (AFM), scanning electron microscopy (SEM), and grazing incidence X-ray diffraction (GIXRD). The hardness and Young’s modulus were determined by nano-Indenter. The wear behavior and adhesion was analyzed by pin-on-disc tests and scratch adhesion tests and the corrosion resistance was evaluated by electrochemical measurements. The results show that the TiN films that were deposited by HPPMS outperformed TiN film deposited by DCMS, with improvements on surface roughness, mechanical properties, wear behavior, adhesion strength, and corrosion resistance, thanks to its much denser columnar grain growth structure and preferred orientation of (111) plane with the lowest strain energy. Besides, the process of Ti interlayer deposition by HPPMS can enhance the film properties to an extent as compared to DCMS, which is attributed to the enhanced ion bombardment during the HPPMS.

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“…HPPMS deposited Ti-N thin film can protect activated metals such as depleted uranium from aerated neutral NaCl solution corrosion [9]. In addition, the Coatings 2021, 11, 579 2 of 9 drawbacks of low deposition rate of HPPMS can be alleviated by using low magnetic field strength [10], introduction of MF pulses during off-time of HPPMS [11], and regulating the pulse-on time and frequency into an optimum value [12].…”

Section: Introductionmentioning

confidence: 99%

Effect of Ion Energy on the Microstructure and Properties of Titanium Nitride Thin Films Deposited by High Power Pulsed Magnetron Sputtering

Deng

Liu

et al. 2021

Coatings

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Titanium nitride (Ti-N) thin films are electrically and thermally conductive and have high hardness and corrosion resistance. Dense and defect-free Ti-N thin films have been widely used in the surface modification of cutting tools, wear resistance components, medical implantation devices, and microelectronics. In this study, Ti-N thin films were deposited by high power pulsed magnetron sputtering (HPPMS) and their plasma characteristics were analyzed. The ion energy of Ti species was varied by adjusting the substrate bias voltage, and its effect on the microstructure, residual stress, and adhesion of the thin films were studied. The results show that after the introduction of nitrogen gas, a Ti-N compound layer was formed on the surface of the Ti target, which resulted in an increase in the Ti target discharge peak power. In addition, the total flux of the Ti species decreased, and the ratio of the Ti ions increased. The Ti-N thin film deposited by HPPMS was dense and defect-free. When the energy of the Ti ions was increased, the grain size and surface roughness of the Ti-N film decreased, the residual stress increased, and the adhesion strength of the Ti-N thin film decreased.

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Effects of magnetic field strength and deposition pressure on the properties of TiN films produced by high power pulsed magnetron sputtering (HPPMS)

Cited by 34 publications

References 42 publications

High power impulse magnetron sputtering and its applications

High power impulse magnetron sputtering and its applications

TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature

Effect of Ion Energy on the Microstructure and Properties of Titanium Nitride Thin Films Deposited by High Power Pulsed Magnetron Sputtering

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